Registration Dossier
Registration Dossier
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EC number: 231-545-4 | CAS number: 7631-86-9
Substance identity
Identification
- Display Name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Type of Substance
- Composition:
- mono-constituent substance
- Origin:
- inorganic
Substance Identifiers open all close all
I0250
(No other type specified)
The silica substance that we are registering is pyrogenic
(No other type specified)
Compositions
Boundary Composition(s) open all close all
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Snythetic amorphous silicon dioxide, nanostructured material_Set1
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silicon dioxide, nanostructured material, silanized
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatments
- Surface treatment name:
- SAS Silanized
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
- Percentage of coverage of particle surface, %:
- >= 30 - < 100
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic Amorphous Silica, set of nanoforms (Boundary composition provided by Lead Registrant in co-ordination with SAS REACH Consortium)
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material_Set1
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatments
- Surface treatment name:
- Silanized SAS
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
- Percentage of coverage of particle surface, %:
- > 0 - < 50
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silicon dioxide (SAS), nanomaterial, silanized
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Fraction of constituent particles in the size range 1-100 nm:
- 100 - 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silicon dioxide (SAS), nanomaterial
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Fraction of constituent particles in the size range 1-100 nm:
- 100 - 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material_Set1
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
- Description:
- In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction di agrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit f or crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Colloidal silica suspension
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material_Set 1
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatments
- Surface treatment name:
- Silanized SAS
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
- Percentage of coverage of particle surface, %:
- > 0 - < 50
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silica, spheroidal nanostructured material
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatments
- Surface treatment name:
- SAS Silanized
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
- Percentage of coverage of particle surface, %:
- >= 30 - < 100
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Legal Entity Composition(s) open all close all
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material_Set 1
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 2 - <= 25 nm
- Percentile:
- D50
- Range:
- >= 2.56 - <= 50 nm
- Percentile:
- D90
- Range:
- >= 3.5 - <= 70 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 50 - <= 400 m²/g
- Range of volume specific surface area:
- >= 110 - <= 880 m²/cm³
- Skeletal density:
- ca. 2.2 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material_Set 1
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 2 - <= 25 nm
- Percentile:
- D50
- Range:
- >= 2.5 - <= 50 nm
- Percentile:
- D90
- Range:
- >= 3.5 - <= 70 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 800 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 1 760 m²/cm³
- Skeletal density:
- ca. 2.2 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 3.5 - <= 13 nm
- Percentile:
- D50
- Range:
- >= 5 - <= 16 nm
- Percentile:
- D90
- Range:
- >= 7 - <= 19 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 800 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 1 760 m²/cm³
- Skeletal density:
- ca. 2.2 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Silicon dioxide (nano)
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: oval shaped (majority)
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 100 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 6.2 nm
- Range:
- >= 5.2 - <= 7.2 nm
- Percentile:
- D50
- Typical value:
- 10.3 nm
- Range:
- >= 8.3 - <= 12.3 nm
- Percentile:
- D90
- Typical value:
- 19.8 nm
- Range:
- >= 14.8 - <= 24.8 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 100 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- 195 m²/g
- Range of specific surface area:
- >= 175 - <= 215 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Orisil 150 - hydrophilic fumed silica with surface area of approximately 150
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 100 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 8.1 nm
- Range:
- >= 3.1 - <= 13.1 nm
- Percentile:
- D50
- Typical value:
- 16.7 nm
- Range:
- >= 11.7 - <= 21.7 nm
- Percentile:
- D90
- Typical value:
- 31.5 nm
- Range:
- >= 26.5 - <= 35.5 nm
- Fraction of constituent particles in the size range 1-100 nm:
- ca. 100 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- 152 m²/g
- Range of specific surface area:
- >= 145 - <= 159 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Orisil 200 - hydrophilic fumed silica with surface area approximately 200
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 100 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 7.7 nm
- Range:
- >= 2.7 - <= 12.7 nm
- Percentile:
- D50
- Typical value:
- 12.6 nm
- Range:
- >= 7.6 - <= 17.6 nm
- Percentile:
- D90
- Typical value:
- 20.2 nm
- Range:
- >= 15.2 - <= 25.2 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 100 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- 228 m²/g
- Range of specific surface area:
- >= 226 - <= 230 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Orisil 300 - hydrophilic fumed silica with surface area approximately 300
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 100 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 3.5 nm
- Range:
- >= 2.5 - <= 4.5 nm
- Percentile:
- D50
- Typical value:
- 5.7 nm
- Range:
- >= 3.7 - <= 7.7 nm
- Percentile:
- D90
- Typical value:
- 16.7 nm
- Range:
- >= 11.7 - <= 21.7 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 100 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- 318.36 m²/g
- Range of specific surface area:
- >= 300 - <= 340 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Orisil 380 - hydrophilic fumed silica with surface area approximately 380
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 100 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 3.8 nm
- Range:
- >= 2.8 - <= 4.8 nm
- Percentile:
- D50
- Typical value:
- 7.4 nm
- Range:
- >= 4.4 - <= 10.4 nm
- Percentile:
- D90
- Typical value:
- 14.4 nm
- Range:
- >= 9.4 - <= 19.4 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 100 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- 376.75 m²/g
- Range of specific surface area:
- >= 350 - <= 400 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Orisil M130 - hydrophobic fumed silica with surface area after treatment process - approximately 130
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 100 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 11.4 nm
- Range:
- >= 2.4 - <= 20.4 nm
- Percentile:
- D50
- Typical value:
- 18.2 nm
- Range:
- >= 9.2 - <= 27.2 nm
- Percentile:
- D90
- Typical value:
- 31.9 nm
- Range:
- >= 22.9 - <= 30.9 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 100 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- 124 m²/g
- Range of specific surface area:
- >= 122 - <= 126 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Orisil M200 - hydrophobic fumed silica with surface area after treatment process - approximately 200
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100
- Range:
- >= 100 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 5 nm
- Range:
- >= 3 - <= 7 nm
- Percentile:
- D50
- Typical value:
- 8.1 nm
- Range:
- >= 5.1 - <= 11.1 nm
- Percentile:
- D90
- Typical value:
- 15.5 nm
- Range:
- >= 10.5 - <= 20.5 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 100 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- 175.92 m²/g
- Range of specific surface area:
- >= 150 - <= 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Orisil SF125 - hydrophobic fumed silica with surface area after treatment process - approximately 125
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 100 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 9.7 nm
- Range:
- >= 3.7 - <= 15.7 nm
- Percentile:
- D50
- Typical value:
- 15 nm
- Range:
- >= 9 - <= 21 nm
- Percentile:
- D90
- Typical value:
- 23.2 nm
- Range:
- >= 17.2 - <= 29.2 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 100 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- 140 m²/g
- Range of specific surface area:
- >= 138 - <= 142 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- silicon dioxide
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 8 - <= 90 nm
- Percentile:
- D50
- Range:
- >= 5 - <= 50 nm
- Percentile:
- D10
- Range:
- >= 2 - <= 30 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- SAS, nanostructured material
- Pure structure:
- yes
- Range:
- >= 99.9 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. T
he detection limit for crystallinity by X-ray is below the maximum order of 0.3% by weight.
Specific surface area
- Range of specific surface area:
- >= 80 - <= 800 m²/g
- Range of volume specific surface area:
- >= 200 - <= 1 500 m²/cm³
- Skeletal density:
- ca. 2.24 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material, ST
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 8 - <= 90 nm
- Percentile:
- D50
- Range:
- >= 5 - <= 50 nm
- Percentile:
- D10
- Range:
- >= 2 - <= 30 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- SAS, nanostructured material, ST
- Pure structure:
- yes
- Range:
- >= 99.9 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. T
he detection limit for crystallinity by X-ray is below the maximum order of 0.3% by weight.
Specific surface area
- Range of specific surface area:
- >= 80 - <= 800 m²/g
- Range of volume specific surface area:
- >= 200 - <= 1 500 m²/cm³
- Skeletal density:
- ca. 2.24 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatmentsopen allclose all
- Surface treatment name:
- SAS, nanostructured material, ST
sythetically-spherical-other/phenyl 1
Surface treatmentopen allclose all
- Order:
- #2
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes hydrophilic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups: Phenyl - Percentage of coverage of particle surface, %:
- >= 90 - <= 100
- Surface treatment name:
- SAS, nanostructured material, ST
sythetically-spherical-methacryl 1
Surface treatment
- Order:
- #1
- External layer:
- hydrophilic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes hydrophilic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Methacryl - Percentage of coverage of particle surface, %:
- >= 90 - <= 100
- Surface treatment name:
- SAS, nanostructured material, ST
sythetically-spherical-amino 1
Surface treatment
- Order:
- #1
- External layer:
- hydrophilic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes hydrophilic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Amino - Percentage of coverage of particle surface, %:
- >= 90 - <= 100
- Surface treatment name:
- SAS, nanostructured material, ST
sythetically-spherical-alkyl 1
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes hydrophobic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl - Percentage of coverage of particle surface, %:
- >= 90 - <= 100
- Surface treatment name:
- SAS, nanostructured material, ST
waterglass-spherical-alkyl 1b
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes hydrophobic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl - Percentage of coverage of particle surface, %:
- >= 90 - <= 100
- Surface treatment name:
- SAS, nanostructured material, ST
waterglass-spherical-alkyl 1a
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes hydrophobic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl - Percentage of coverage of particle surface, %:
- >= 90 - <= 100
- Surface treatment name:
- SAS, nanostructured material, ST
waterglass-irregular-amino 1
Surface treatment
- Order:
- #1
- External layer:
- hydrophilic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes hydrophilic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Amino - Percentage of coverage of particle surface, %:
- >= 90 - <= 100
- Surface treatment name:
- SAS, nanostructured material, ST
waterglass-irregular-alkyl 1b
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes hydrophobic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl - Percentage of coverage of particle surface, %:
- >= 90 - <= 100
- Surface treatment name:
- SAS, nanostructured material, ST
waterglass-irregular-alkyl 1a
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes hydrophobic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl - Percentage of coverage of particle surface, %:
- >= 90 - <= 100
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Colloidal silica
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 99.95 %
- Range:
- >= 99.9 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 51.15 nm
- Range:
- >= 51.1 - <= 51.2 nm
- Percentile:
- D50
- Typical value:
- ca. 51.35 nm
- Range:
- >= 51.3 - <= 51.4 nm
- Percentile:
- D90
- Typical value:
- ca. 54 nm
- Range:
- >= 53.9 - <= 54.1 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- colloidal silica
- Pure structure:
- yes
- Typical composition:
- ca. 99.95 %
- Range:
- >= 99.9 - <= 100 %
- Crystal system:
- not applicable
Specific surface area
- Typical specific surface area:
- ca. 95 m²/g
- Range of specific surface area:
- >= 50 - <= 150 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Nanoform co-precipitated silicon dioxide
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are spherical in nature.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-Ray diffractograms of the manufactured mixture show no peaks relating to crystalline silicon dioxide.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 800 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide - Set 1
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: Spheroidal
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 6 - <= 69 nm
- Percentile:
- D50
- Range:
- >= 8 - <= 92 nm
- Percentile:
- D90
- Range:
- >= 12 - <= 134 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 95 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Range of specific surface area:
- >= 26 - <= 906 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide - Set 1
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: Spheroidal
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 5 - <= 51 nm
- Percentile:
- D50
- Range:
- >= 7 - <= 69 nm
- Percentile:
- D90
- Range:
- >= 12 - <= 103 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 95 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Range of specific surface area:
- >= 79 - <= 906 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide - Set 2
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: spheroidal
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 7 - <= 47 nm
- Percentile:
- D50
- Range:
- >= 9 - <= 63 nm
- Percentile:
- D90
- Range:
- >= 13 - <= 100 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Range of specific surface area:
- >= 40 - <= 523 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatments
- Surface treatment name:
- silane derivatization
Surface treatmentopen allclose all
- Order:
- #1
- Order:
- #2
- External layer:
- hydrophilic
- Description:
- The silica nanoparticles are silane derivatized by covalent bonding (a condensation reaction) of the hydrolysed organosilanes to the silanols on the surface of the particles. This is done at high temperature (50-90C) and at high pH (9-11), making all the glycidoxypropyl silanes open up to diols (the functionality introduced on the surface of the Levasil CC products). For the Levasil CC 141, CC301 and CC401 products, the glycidoxypropyl silane is the only silane. For the Levasil CC503, a 50/50 molar ratio of glycidoxypropyl and propyl silane is used. No purification of the products is made.
- Percentage of coverage of particle surface, %:
- >= 55 - <= 90
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material_Set 1
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.8 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.2 % by weight or below.
Specific surface area
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Synthetic amorphous silica, uncoated - small nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- 100 %
- Range:
- >= 98 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.2 % by weight or below.
Specific surface area
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Synthetic amorphous silica, uncoated - large nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- 100 %
- Range:
- >= 99.8 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.2 % by weight or below.
Specific surface area
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Legal entity: colloidal silicon dioxide, untreated_Set 1
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 6 - <= 28 nm
- Percentile:
- D50
- Range:
- >= 7 - <= 34 nm
- Percentile:
- D90
- Range:
- >= 10 - <= 55 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that may coagulate to aggregates. Constituent particles are therefore spherical nanoforms in nature while aggregates (and agglomerates) show a high fractal structure typically below 100 nm, in some cases necklace-like assembly structures (see TEM images in IUCLID section 1.4).
- Fraction of constituent particles in the size range 1-100 nm:
- > 90 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- The XRD curve shows a broad distribution of Si-Si bonds indicating that colloidal SiO2 is clearly of amorphous nature containing no detectable silicon dioxide of crystalline structure (detection limit 0.3%).
Specific surface area
- Range of specific surface area:
- >= 100 - <= 600 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Legal entity: colloidal silicon dioxide, untreated_Set 1
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 45 - <= 55 nm
- Percentile:
- D50
- Range:
- >= 60 - <= 85 nm
- Percentile:
- D90
- Range:
- >= 80 - <= 110 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that may coagulate to aggregates. Constituent particles are therefore spherical nanoforms in nature while aggregates (and agglomerates) show a high fractal structure typically below 100 nm (see TEM images in IUCLID section 1.4).
- Fraction of constituent particles in the size range 1-100 nm:
- > 80 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- The XRD curve shows a broad distribution of Si-Si bonds indicating that colloidal SiO2 is clearly of amorphous nature containing no detectable silicon dioxide of crystalline structure (detection limit 0.3%).
Specific surface area
- Range of specific surface area:
- >= 40 - <= 100 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Legal entity: colloidal silicon dioxide, untreated_Set 1
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 20 - <= 185 nm
- Percentile:
- D50
- Range:
- >= 50 - <= 195 nm
- Percentile:
- D90
- Range:
- >= 100 - <= 202 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that may coagulate to aggregates. Constituent particles are therefore spherical nanoforms in nature while aggregates (and agglomerates) show a high fractal structure. In LE composition 3: colloidal silicon dioxide, untreated_Set 1 (Types G, H, I), typically more than 50 % of the constituent particles are in the range 1 - 100 nm (see TEM images in IUCLID section 1.4).
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- The XRD curve shows a broad distribution of Si-Si bonds indicating that colloidal SiO2 is clearly of amorphous nature containing no detectable silicon dioxide of crystalline structure (detection limit 0.3%).
Specific surface area
- Range of specific surface area:
- >= 20 - <= 50 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Legal entity: colloidal silicon dioxide, silanized_Set 2
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 8 - <= 163 nm
- Percentile:
- D50
- Range:
- >= 13 - <= 180 nm
- Percentile:
- D90
- Range:
- >= 17 - <= 190 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that may coagulate to aggregates. Constituent particles are therefore spherical nanoforms in nature while aggregates (and agglomerates) show a high fractal structure typically below 100 nm, in some cases necklace-like assembly structures. In LE composition 4: colloidal silicon dioxide, silanized_Set 2_ <= 1 % (w/w) STA (Types C, D, E, G, I, K), typically more than 50 % of the constituent particles are in the range 1 - 100 nm (see TEM images in IUCLID section 1.4).
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- The XRD curve shows a broad distribution of Si-Si bonds indicating that colloidal SiO2 is clearly of amorphous nature containing no detectable silicon dioxide of crystalline structure (detection limit 0.3%).
Specific surface area
- Range of specific surface area:
- >= 20 - <= 250 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Legal entity: colloidal silicon dioxide, silanized_Set 2
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 23 - <= 105 nm
- Percentile:
- D50
- Range:
- >= 29 - <= 110 nm
- Percentile:
- D90
- Range:
- >= 34 - <= 120 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that may coagulate to aggregates. Constituent particles are therefore spherical nanoforms in nature while aggregates (and agglomerates) show a high fractal structure. In LE composition 5: colloidal silicon dioxide, silanized_Set 2_ 2-4 % (w/w) STA (Types D, E, G), typically more than 50 % of the constituent particles are in the range 1 - 100 nm (see TEM images in IUCLID section 1.4).
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- The XRD curve shows a broad distribution of Si-Si bonds indicating that colloidal SiO2 is clearly of amorphous nature containing no detectable silicon dioxide of crystalline structure (detection limit 0.3%).
Specific surface area
- Range of specific surface area:
- >= 30 - <= 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Legal entity: colloidal silicon dioxide, silanized_Set 2
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 7 - <= 12 nm
- Percentile:
- D50
- Range:
- >= 10 - <= 17 nm
- Percentile:
- D90
- Range:
- >= 14 - <= 21 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that may coagulate to aggregates. Constituent particles are therefore spherical nanoforms in nature while aggregates (and agglomerates) show a high fractal structure typically below 100 nm (see TEM images in IUCLID section 1.4).
- Fraction of constituent particles in the size range 1-100 nm:
- > 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- The XRD curve shows a broad distribution of Si-Si bonds indicating that colloidal SiO2 is clearly of amorphous nature containing no detectable silicon dioxide of crystalline structure (detection limit 0.3%).
Specific surface area
- Range of specific surface area:
- >= 200 - <= 300 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Synthetic Amorphous Silica (SAS)
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Typical composition:
- 92.9 %
- Range:
- > 90 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Typical value:
- 47.2 nm
- Range:
- >= 29.2 - <= 65.2 nm
- Percentile:
- D50
- Typical value:
- 26.1 nm
- Range:
- >= 8 - <= 44 nm
- Percentile:
- D10
- Typical value:
- 9.4 nm
- Range:
- >= 2 - <= 27.4 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 99 - < 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Typical composition:
- ca. 92.9 %
- Range:
- > 90 - <= 100 %
Specific surface area
- Typical specific surface area:
- 523 m²/g
- Range of specific surface area:
- > 518 - < 528 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- HELPE amorphous silicon dioxide with D99<50 nm
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 100 %
- Range:
- ca. 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 12.1 nm
- Range:
- >= 1 - <= 20 nm
- Percentile:
- D50
- Typical value:
- ca. 16.8 nm
- Range:
- >= 8 - <= 30 nm
- Percentile:
- D90
- Typical value:
- ca. 22.3 nm
- Range:
- >= 10 - <= 40 nm
- Percentile:
- D99
- Typical value:
- ca. 27.1 nm
- Range:
- >= 14 - <= 50 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- ca. 125.9 m²/g
- Range of specific surface area:
- >= 80 - <= 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silicon dioxide (SAS), nanostructured material, silanized
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- 100 - 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 10 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 6.8 - <= 2 250 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silicon dioxide (SAS), nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- 100 - 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The limit of quantifcation is 0.3 % corresponding to a limit of detection of 0.1 % quartz. The maximum quartz content is less than 0.1%.
Specific surface area
- Range of specific surface area:
- >= 10 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 6.8 - <= 2 250 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material_Set 1
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 10.2 - <= 103.7 nm
- Percentile:
- D10
- Range:
- >= 5.8 - <= 45.2 nm
- Percentile:
- D50
- Range:
- >= 8 - <= 69 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 5 - <= 67.6 nm
- Percentile:
- D50
- Range:
- >= 5 - <= 40 nm
- Percentile:
- D10
- Range:
- >= 1 - <= 27.8 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystal linity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- 1083_Synthetic amorphous silica comprises a few large and high porous agglomerates composed of very small SiO2 nanoparticles, which are generally spheroidal in morphology.
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 100 %
- Range:
- %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 1.2 nm
- Range:
- > 1.17 - < 1.23 nm
- Percentile:
- D50
- Typical value:
- 1.6 nm
- Range:
- > 1.57 - < 1.63 nm
- Percentile:
- D90
- Typical value:
- 2.1 nm
- Range:
- > 2.07 - < 2.13 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- synthetic amorpous silica
- Pure structure:
- yes
- Range:
- 100 %
- Crystal system:
- not applicable
Specific surface area
- Typical specific surface area:
- 521 m²/g
- Range of specific surface area:
- > 516 - < 526 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- synthetic amorphous silicon dioxide, nanostructured material, silanized
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Typical composition:
- ca. 99 %
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 20.4 nm
- Range:
- >= 20 - <= 21 nm
- Percentile:
- D50
- Typical value:
- 26.9 nm
- Range:
- >= 25 - <= 28 nm
- Percentile:
- D90
- Typical value:
- 33.7 nm
- Range:
- >= 32 - <= 34 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 99.9 %
- Range:
- > 99.9 - <= 100 %
Specific surface area
- Typical specific surface area:
- 84 m²/g
- Range of specific surface area:
- > 80 - <= 85 m²/g
- Typical volume specific surface area:
- 184.8 m²/cm³
- Range of volume specific surface area:
- > 180 - <= 190 m²/cm³
- Skeletal density:
- >= 2.1 - <= 2.3 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
Surface treatments
- Surface treatment name:
- Polydimethylsiloxanes
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- Process description behind surface functionalization / treatment: Dry Process
-Main features of surface treatment / functionalization process: Introduce the alkyl groups on the
surface of silica.
-Process / reaction type: Elimination-Addition (Condensation) Reaction
Typical Reaction Formula : ([Silica Surface]-OH)2 + HO-((CH3)2SiO)n-H -> ([Silica Surface]-O-)2-
(Si(CH3)2O)n + 2H2O
-Purification step: H2O and Residual treatment agent removal process
-Functions introduced by treatment : Alkyl (Methyl) groups
Detailed information can be found in the “Attached Information” section of the document.
The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have
been generally registered under REACH as relevant. The use as surface treatment agents is desc
ribed in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes,
silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-
% typically less than 10 wt-%. - Percentage of coverage of particle surface, %:
- ca. 100
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- amorphous_SiO2_untreated
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
- Remarks:
- aggregates and agglomerates of primary nano particles
Percentileopen allclose all
- Percentile:
- D90
- Typical value:
- ca. 13.3 μm
- Range:
- > 10 - < 15 μm
- Percentile:
- D50
- Typical value:
- ca. 8.23 μm
- Range:
- > 6 - < 10 μm
- Percentile:
- D10
- Typical value:
- ca. 5.13 μm
- Range:
- > 3 - < 6 μm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
The nanostructured material thus consists of aggregates and agglomerates which are composed of fused primary particles. Even after ultrasonic treatment, aggregates were the constituent particle. There was no physical boundary between the fine features within aggregates. The aggregates are composed of primary particles around 20nm (average aspect ratio 1.18). Free “primary particles” were not observed. - Fraction of constituent particles in the size range 1-100 nm:
- 0 - ca. 0 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous silicon dioxide
- Pure structure:
- yes
- Typical composition:
- > 99.7 %
- Range:
- > 99.7 - 100 %
- Description:
- A crystalline structure of Silicon dioxide was not detected in the sample. The amount of crystalline Silicon dioxides was less than 0.3%.
Specific surface area
- Typical specific surface area:
- ca. 160 m²/g
- Range of specific surface area:
- > 159 - < 160.7 m²/g
- Skeletal density:
- > 2.18 - < 2.19 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- amorphous silicon dioxide, nanostructured material, silanized
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Typical value:
- 40 nm
- Range:
- >= 7 - <= 41 nm
- Percentile:
- D10
- Typical value:
- 9.8 nm
- Range:
- >= 7 - <= 41 nm
- Percentile:
- D50
- Typical value:
- 13.7 nm
- Range:
- >= 7 - <= 41 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- ca. 187.35 m²/g
- Range of specific surface area:
- >= 180 - <= 200 m²/g
- Skeletal density:
- ca. 1.602 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
Surface treatments
- Surface treatment name:
- Reaction with Octydecyltrichlorosilane
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- Main features of the surface treatment/functionalisation process:
The main process involves reacting C18 silane (Octadecyltrichlorosilane CAS: 112-04-9) with silica at room temperature for 12 to 18 hour in Toluene, then washing with methanol and drying at 80 to 120 C for up to 24 hours
- Molar ratio of each surface treating agent used:
400-450 g of Octadecyltrichlorosilane/ kg of silica
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups):
Introduction of a C18 alkyl chain.- Percentage of coverage of particle surface, %:
- >= 30 - <= 100
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Colloidal silica suspension
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- ca. 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 14 - <= 15.8 nm
- Percentile:
- D50
- Range:
- >= 12.5 - < 14 nm
- Percentile:
- D10
- Range:
- >= 11.4 - < 12.5 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 95 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Range of specific surface area:
- >= 140 - <= 150 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material_Set 1
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 6 - <= 15 nm
- Percentile:
- D50
- Range:
- >= 8 - <= 50 nm
- Percentile:
- D90
- Range:
- >= 14 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 25 - <= 750 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 6 - <= 15 nm
- Percentile:
- D50
- Range:
- >= 8 - <= 50 nm
- Percentile:
- D90
- Range:
- >= 14 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 25 - <= 750 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatments
- Surface treatment name:
- Silane Derivatization
Surface treatment
- External layer:
- hydrophobic
- Description:
- - Main features of the surface treatment/functionalisation process: Coating of silane is a chemical process. In a typical process, alkoxy silanes are added to an aqueous slurry of precipitated silica at elevated temperature and pH. Once introduced a hydrolysis reaction occurs releasing alkoxide moieities from the silane, thus allowing for condensation reaction of the hydrolyzed silanes and silanols on the surface of the silica.
- The type of process/reaction: silane derivatization.
- Relevant ranges of process parameters such as reaction conditions (pH, temperature): Silanization is done at high pH (8-11) and high temperature (50 -98 °C).
- Any purification step: Filtration using filter press or belt filters to remove residual salts and ethanol.
- Molar ratio of each surface treating agent used: 0.0025-0.014:1 on a mole ratio basis.
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Thiol (mercapto). - Percentage of coverage of particle surface, %:
- > 0 - < 50
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- hydrophilic fumed silica
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 100 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 3.5 nm
- Range:
- >= 2 - <= 5 nm
- Percentile:
- D50
- Typical value:
- 5.7 nm
- Range:
- >= 3 - <= 10 nm
- Percentile:
- D90
- Typical value:
- 16.7 nm
- Range:
- >= 10 - <= 24 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 100 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- 318 m²/g
- Range of specific surface area:
- >= 300 - <= 340 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- > 99 - < 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 10 - < 40 nm
- Percentile:
- D50
- Range:
- > 15 - < 60 nm
- Percentile:
- D90
- Range:
- > 20 - < 80 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent part cles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - < 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99 - <= 100 %
Specific surface area
- Range of specific surface area:
- > 600 - < 800 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- amorphous silica, (spheroidal) nanostructured material, non functionalized
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 100 %
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and rangeopen allclose all
- Shape category:
- spheroidal
- Remarks:
- Two different populations of spherical silica nanoparticles were identified in the sample. The characterization of the first population is provided below.
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 1.6 nm
- Range:
- >= 1 - <= 2.6 nm
- Percentile:
- D50
- Typical value:
- ca. 2.6 nm
- Range:
- >= 2 - <= 5 nm
- Percentile:
- D90
- Typical value:
- 4.3 nm
- Range:
- >= 5 - <= 8.1 nm
- Additional information:
- Minimum diameter (nm) 1.0
Maximum diameter (nm) 8.1 - Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
- Shape category:
- spheroidal
- Remarks:
- Two different populations of spherical silica nanoparticles were identified in the sample. The characterization of the second population is provided below.
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 17.3 nm
- Range:
- >= 9.3 - <= 19.2 nm
- Percentile:
- D50
- Typical value:
- ca. 22.5 nm
- Range:
- >= 19.6 - <= 25.4 nm
- Percentile:
- D90
- Typical value:
- 27.9 nm
- Range:
- >= 23.4 - <= 52.1 nm
- Additional information:
- Minimum diameter (nm) 9.3 ± 1.1
Maximum diameter (nm) 52.1 ± 18.2 - Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- >= 99.9 %
- Range:
- >= 99 - <= 100 %
- Description:
- The investigation of the crystalline morphology of the nanoform confirmed that particles are completely amorphous.
Specific surface area
- Typical specific surface area:
- ca. 112 m²/g
- Range of specific surface area:
- >= 105 - <= 119 m²/g
- Typical volume specific surface area:
- ca. 269 m²/cm³
- Range of volume specific surface area:
- >= 252 - <= 286 m²/cm³
- Skeletal density:
- ca. 2.4 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Synthetic amorphous silica, spheroidal nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Skeletal density:
- ca. 1.9 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 800 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
Surface treatments
- Surface treatment name:
- hydrophilic
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of nanoform:
- WACKER Fumed SAS
- Name of set of nanoforms:
- Set 1
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of nanoform:
- WACKER Precipitated SAS
- Name of set of nanoforms:
- Set 1
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- WACKER Silanized SAS
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatmentsopen allclose all
- Surface treatment name:
- SAS Silanized
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
- Percentage of coverage of particle surface, %:
- >= 30 - < 100
- Surface treatment name:
- CAS 75-78-5
Surface treatmentopen allclose all
- Order:
- #2
- Order:
- #3
- Order:
- #4
- Order:
- #5
- Order:
- #6
- Order:
- #7
- Order:
- #8
- Order:
- #9
- Order:
- #10
- Order:
- #11
- Order:
- #12
- External layer:
- hydrophobic
- Description:
- Reaction of SAS with dichloro(dimethyl)silane, CAS 75-78-5. Typical carbon content below 10%.
Examples H15 grade 0.8-1.2 % C; H18 grade 4.0-5.2 % C (highest carbon content). - Percentage of coverage of particle surface, %:
- >= 30 - < 100
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- WACKER Precipitated SAS
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- WACKER Fumed SAS
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured colloidal material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 10 - <= 90 nm
- Percentile:
- D50
- Range:
- >= 8 - <= 60 nm
- Percentile:
- D10
- Range:
- >= 5 - <= 40 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- Colloidal silica
- Pure structure:
- yes
- Range:
- >= 99.9 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. T
he detection limit for crystallinity by X-ray is below the maximum order of 0.3% by weight.
Specific surface area
- Range of specific surface area:
- >= 30 - <= 200 m²/g
- Range of volume specific surface area:
- >= 80 - <= 600 m²/cm³
- Skeletal density:
- ca. 2.48 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured colloidal material, ST
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 10 - <= 90 nm
- Percentile:
- D50
- Range:
- >= 8 - <= 60 nm
- Percentile:
- D10
- Range:
- >= 5 - <= 40 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- Colloidal silica
- Pure structure:
- yes
- Range:
- >= 99.9 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. T
he detection limit for crystallinity by X-ray is below the maximum order of 0.3% by weight.
Specific surface area
- Range of specific surface area:
- >= 30 - <= 200 m²/g
- Range of volume specific surface area:
- >= 80 - <= 600 m²/cm³
- Skeletal density:
- ca. 2.48 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatments
- Surface treatment name:
- Klebosol, ST Alox
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
- Main features of the surface treatment/functionalisation process: product becomes cationic
- the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
- any purification step: no
- Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Al2O3 - Percentage of coverage of particle surface, %:
- > 90 - < 100
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Speroidal
Shape
Shape description
- Shape category:
- spheroidal
- Remarks:
- ND and Z1, primary particle shape: 100% spherical particles with regular shape.
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 100 %
- Range:
- ca. 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
- Remarks:
- ND and Z1
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- >= 1.2 nm
- Range:
- >= 0.5 - <= 10 nm
- Percentile:
- D50
- Typical value:
- >= 2.9 nm
- Range:
- >= 2 - <= 14 nm
- Percentile:
- D90
- Typical value:
- >= 11 nm
- Range:
- >= 5 - <= 40 nm
- Additional information:
- According to the TEM image and histogram, ND type Quartzene material’s particle dize varies between 1 to 20 nm where as the majority of the particles are below 10 nm in size.
As it can be seen from the TEM analysis, Z1 type Quartzene material’s particle size varies between 5 to 20 nm in the image and it should be mentioned that the analytical sample is an example of the Z1 particles on the TEM grid, different parts of the same gird may have different particles and the particle size can vary between 10 to 30 nm in size. - Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- >= 99.7 %
- Range:
- >= 99.7 - <= 100 %
- Crystal system:
- not applicable
- Description:
- Z1 and ND is 100% amorphous (< 0,3 % crystalline parts). X-ray diffraction diagrams of ND/Z1 show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below. please see XRD-analysis for confirmation.
Specific surface area
- Typical specific surface area:
- >= 279 m²/g
- Range of specific surface area:
- >= 122 - <= 556 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
- Name of nanoform:
- Speroidal
Shape
Shape description
- Shape category:
- spheroidal
- Remarks:
- Z1 Primary particle shape: 100% spherical particles with regular shape
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 100 %
- Range:
- ca. 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
- Remarks:
- Z1
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 7.1 nm
- Range:
- >= 5 - <= 10 nm
- Percentile:
- D50
- Typical value:
- ca. 10.8 nm
- Range:
- >= 8 - <= 14 nm
- Percentile:
- D90
- Typical value:
- ca. 23 nm
- Range:
- >= 12 - <= 40 nm
- Additional information:
- According to the TEM image and histogram, ND type Quartzene material’s particle dize varies between 1 to 20 nm where as the majority of the particles are below 10 nm in size.
As it can be seen from the TEM analysis, Z1 type Quartzene material’s particle size varies between 5 to 20 nm in the image and it should be mentioned that the analytical sample is an example of the Z1 particles on the TEM grid, different parts of the same gird may have different particles and the particle size can vary between 10 to 30 nm in size. - Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- >= 99.7 %
- Range:
- >= 99.7 - <= 100 %
- Description:
- Z1 and ND is 100% amorphous (< 0,3 % crystalline parts). X-ray diffraction diagrams of ND/Z1 show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below. please see XRD-analysis for confirmation.
Specific surface area
- Typical specific surface area:
- >= 390 m²/g
- Range of specific surface area:
- >= 122 - <= 556 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
Surface treatments
- Surface treatment name:
- Hydrophobization of silica whit Hexamethyldisilazane
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- Hydrophobization of silica whit Hexamethyldisilazane
- Percentage of coverage of particle surface, %:
- >= 30 - <= 100
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 5 - < 20 nm
- Percentile:
- D50
- Range:
- > 10 - < 30 nm
- Percentile:
- D90
- Range:
- > 15 - < 40 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - < 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99 - <= 100 %
Specific surface area
- Range of specific surface area:
- > 500 - < 700 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 5 - < 15 nm
- Percentile:
- D50
- Range:
- > 7 - < 25 nm
- Percentile:
- D90
- Range:
- > 10 - < 35 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99 - <= 100 %
Specific surface area
- Range of specific surface area:
- > 310 - < 410 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 5 - < 15 nm
- Percentile:
- D50
- Range:
- > 7 - < 30 nm
- Percentile:
- D90
- Range:
- > 10 - < 40 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- > 120 - < 250 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silicon dioxide, nanostructured material, silanized
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- > 98 - < 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 2 - < 15 nm
- Percentile:
- D50
- Range:
- > 4 - < 30 nm
- Percentile:
- D90
- Range:
- > 10 - < 45 nm
- Additional information:
- Synthetic amorphous silica exists as a nanostructured material consisting of aggregates and agglomerates which are composed of primary particles; the particle size from the DLS results is larger than the primary particles size.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - < 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 98 - < 100 %
Specific surface area
- Range of specific surface area:
- > 50 - < 500 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silica, nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 2 - < 15 nm
- Percentile:
- D50
- Range:
- > 4 - < 35 nm
- Percentile:
- D90
- Range:
- > 8 - < 45 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - < 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99 - <= 100 %
Specific surface area
- Range of specific surface area:
- > 50 - < 500 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silica, nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 4 - < 10 nm
- Percentile:
- D50
- Range:
- > 6 - < 20 nm
- Percentile:
- D90
- Range:
- 10 - < 50 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99 - <= 100 %
Specific surface area
- Range of specific surface area:
- > 250 - < 370 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- synthetic amorphous silicon dioxide, nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 5 - < 20 nm
- Percentile:
- D50
- Range:
- > 10 - < 35 nm
- Percentile:
- D90
- Range:
- > 13 - < 80 nm
- Additional information:
- The result of DLS is only used as an auxiliary reference and does not represent the true primary particle size. The data D10,D50 and D90 is base on the result of TEM and DLS.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 90 - < 100 %
Specific surface area
- Range of specific surface area:
- > 140 - < 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
- Name of set of nanoforms:
- Synthetic amorphous silica, nanostructured material
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- > 99 - < 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- > 15 - < 60 nm
- Percentile:
- D50
- Range:
- > 10 - < 30 nm
- Percentile:
- D10
- Range:
- > 8 - < 20 nm
- Additional information:
- The D10, D50 and D90 data is based on the result of TEM and DLS.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - < 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99 - < 100 %
Specific surface area
- Range of specific surface area:
- > 120 - < 210 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D25
- Typical value:
- ca. 5.8 nm
- Range:
- >= 4.1 - <= 7.5 nm
- Percentile:
- D50
- Typical value:
- ca. 6.8 nm
- Range:
- >= 4.3 - <= 9.3 nm
- Percentile:
- D75
- Typical value:
- ca. 8.1 nm
- Range:
- >= 5.2 - <= 11 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- < 3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Typical specific surface area:
- ca. 310 m²/g
- Range of specific surface area:
- >= 216.2 - <= 312.5 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 1 - < 100 nm
- Percentile:
- D25
- Typical value:
- ca. 7.2 nm
- Range:
- >= 5.5 - <= 9.5 nm
- Percentile:
- D50
- Typical value:
- ca. 8.4 nm
- Range:
- >= 5.8 - <= 11.9 nm
- Percentile:
- D75
- Typical value:
- ca. 9.9 nm
- Range:
- >= 7 - <= 14.1 nm
- Percentile:
- D90
- Range:
- > 1 - <= 100 nm
- Typical aspect ratio (:1):
- < 3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Typical specific surface area:
- ca. 297 m²/g
- Range of specific surface area:
- >= 280.8 - <= 299.2 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D25
- Typical value:
- ca. 3.5 nm
- Range:
- >= 1.9 - <= 5.3 nm
- Percentile:
- D50
- Typical value:
- ca. 4.3 nm
- Range:
- >= 1.8 - <= 7.3 nm
- Percentile:
- D75
- Typical value:
- ca. 5.2 nm
- Range:
- >= 2.3 - <= 8.9 nm
- Percentile:
- D90
- Range:
- >= 1 - < 100 nm
- Typical aspect ratio (:1):
- < 3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Typical specific surface area:
- ca. 673 m²/g
- Range of specific surface area:
- >= 609.4 - <= 674.6 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - < 100 nm
- Percentile:
- D25
- Typical value:
- ca. 4.5 nm
- Range:
- >= 2.9 - <= 6.1 nm
- Percentile:
- D50
- Typical value:
- ca. 5.5 nm
- Range:
- >= 3 - <= 8 nm
- Percentile:
- D75
- Typical value:
- ca. 6.5 nm
- Range:
- >= 3.6 - <= 9.4 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- < 3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Typical specific surface area:
- ca. 601 m²/g
- Range of specific surface area:
- >= 597.8 - <= 604.2 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- 1 - < 100 nm
- Percentile:
- D25
- Typical value:
- ca. 5.2 nm
- Range:
- >= 3.6 - <= 6.8 nm
- Percentile:
- D50
- Typical value:
- ca. 6.9 nm
- Range:
- >= 4.4 - <= 9.4 nm
- Percentile:
- D75
- Typical value:
- ca. 8.4 nm
- Range:
- >= 5.5 - <= 11.3 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- < 3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Typical specific surface area:
- ca. 964 m²/g
- Range of specific surface area:
- >= 960.9 - <= 967.1 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Typical composition:
- ca. 99.7 %
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 15 nm
- Range:
- >= 0 - <= 20 nm
- Percentile:
- D50
- Typical value:
- ca. 23 nm
- Range:
- >= 0 - <= 60 nm
- Percentile:
- D90
- Typical value:
- ca. 46 nm
- Range:
- >= 30 - <= 60 nm
- Typical length:
- ca. 23 nm
- Range of length:
- >= 1 - <= 100 nm
- Typical lateral dimension 1:
- ca. 23 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Typical lateral dimension 2:
- ca. 23 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- ca. 1 :1
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
As shape is spheroidal, Typical lateral dimension 1, Typical lateral dimension 2 are equal to Typical Length . Typical Length is d50 value.
As shape is spheroidal, Typical aspect ration is 1 (the substance is not in fiber form).
Please see report 2020.075 - SID 17211. (ex batch number I044458101) - Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- > 99.7 %
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
For concerned substance, please see reports HSL report_June 2018 / Laboratory number 1801858 LEVILITE Precipitated amorphous silica p3, 2020.075 - SID 17211 and ECETOC2006_2-3-1_xray.
Specific surface area
- Typical specific surface area:
- ca. 528 m²/g
- Range of specific surface area:
- >= 200 - <= 700 m²/g
- Typical volume specific surface area:
- ca. 1 104 m²/cm³
- Range of volume specific surface area:
- >= 400 - <= 1 500 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silica, amorphous, pyrogenic, crystalline-free
- CAS Number:
- 112945-52-5
- Molecular formula:
- O2Si
- IUPAC Name:
- Silica, amorphous, pyrogenic, crystalline-free
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- >= 99 %
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Typical value:
- 73 nm
- Range:
- >= 69 - <= 76 nm
- Percentile:
- D10
- Typical value:
- 34 nm
- Range:
- >= 29 - <= 39 nm
- Percentile:
- D50
- Typical value:
- 55 nm
- Range:
- >= 47 - <= 59 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- silica
- Pure structure:
- yes
- Typical composition:
- >= 99 %
- Range:
- >= 95 - <= 100 %
- Crystal system:
- not applicable
Specific surface area
- Typical specific surface area:
- 143.8 m²/g
- Range of specific surface area:
- >= 136.5 - <= 152.4 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Typical composition:
- 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 12.7 nm
- Range:
- >= 1 - <= 15 nm
- Percentile:
- D50
- Typical value:
- 16.5 nm
- Range:
- >= 13 - <= 18 nm
- Percentile:
- D90
- Typical value:
- 20.1
- Range:
- >= 17 - <= 25 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- > 99.7 %
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Typical specific surface area:
- 141.68 m²/g
- Range of specific surface area:
- >= 100 - <= 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 55 nm
- Range:
- >= 45 - <= 80 nm
- Percentile:
- D50
- Typical value:
- ca. 100 nm
- Range:
- >= 80 - <= 150 nm
- Percentile:
- D90
- Typical value:
- ca. 260 nm
- Range:
- >= 190 - <= 330 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- >= 82 - <= 98 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- synthetic amorphous silica
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- ca. 160 m²/g
- Range of specific surface area:
- >= 85 - <= 235 m²/g
- Typical volume specific surface area:
- 342 m²/cm³
- Range of volume specific surface area:
- >= 182 - <= 503 m²/cm³
- Skeletal density:
- ca. 2.14 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- > 1 - <= 100 nm
- Percentile:
- D90
- Range:
- > 1 - <= 100 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 50 - <= 650 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- > 500 - <= 1 000 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 20 nm
- Percentile:
- D50
- Range:
- >= 20 - <= 45 nm
- Percentile:
- D90
- Range:
- >= 45 - <= 80 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 50 - <= 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- 15 - <= 25 nm
- Percentile:
- D50
- Range:
- 13 - <= 20 nm
- Percentile:
- D10
- Range:
- 1 - <= 16 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- 100 - <= 250 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 4.8 nm
- Range:
- > 1.4 - < 8.2 nm
- Percentile:
- D50
- Typical value:
- 7.9 nm
- Range:
- > 4.5 - < 11.3 nm
- Percentile:
- D90
- Typical value:
- 13.1 nm
- Range:
- > 9.7 - < 16.5 nm
- Typical aspect ratio (:1):
- 1.3 :1
- Range of aspect ratio (:1):
- 1.1 - 1.7
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
Specific surface area
- Typical specific surface area:
- 237 m²/g
- Range of specific surface area:
- > 200 - < 300 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: potato like
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 12 - <= 42 nm
- Percentile:
- D50
- Range:
- >= 15 - <= 57 nm
- Percentile:
- D90
- Range:
- >= 21 - <= 89 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- >= 200 m²/g
- Range of specific surface area:
- >= 85 - <= 298 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Typical composition:
- > 99 %
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 4 - <= 10 nm
- Percentile:
- D50
- Range:
- >= 10 - <= 20 nm
- Percentile:
- D90
- Range:
- > 12 - <= 30 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- ca. 1 :1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 95 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- Amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 70 - <= 330 m²/g
- Range of volume specific surface area:
- >= 154 - <= 726 m²/cm³
- Skeletal density:
- ca. 2.2 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Typical composition:
- > 99 %
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 4 - <= 10 nm
- Percentile:
- D50
- Range:
- >= 10 - <= 25 nm
- Percentile:
- D90
- Range:
- > 12 - <= 35 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- ca. 1 :1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 95 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- Amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 44 - <= 330 m²/g
- Range of volume specific surface area:
- >= 96.8 - <= 726 m²/cm³
- Skeletal density:
- ca. 2.2 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 12.7 - <= 24 nm
- Percentile:
- D50
- Range:
- >= 9.4 - <= 16 nm
- Percentile:
- D10
- Range:
- >= 7.4 - <= 9 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 75 - <= 420 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 14 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 11 - <= 100 nm
- Percentile:
- D10
- Range:
- >= 9 - <= 62 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 20 - <= 280 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Typical value:
- ca. 14 nm
- Range:
- ca. 14 - ca. 14 nm
- Percentile:
- D50
- Typical value:
- ca. 12 nm
- Range:
- >= 9 - ca. 15 nm
- Percentile:
- D10
- Typical value:
- ca. 9 nm
- Range:
- ca. 9 - ca. 9 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 105 - <= 135 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 12.7 - <= 31 nm
- Percentile:
- D50
- Typical value:
- ca. 9 nm
- Range:
- >= 3 - <= 29 nm
- Percentile:
- D10
- Range:
- >= 7.4 - <= 11 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 50 - <= 450 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: open cellular network
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 2 - <= 2.5 nm
- Percentile:
- D50
- Range:
- >= 1.5 - < 1.75 nm
- Percentile:
- D10
- Range:
- >= 1 - <= 1.5 nm
- Additional information:
- The reported D50, D10 and D90 values in the low nano-size range refer to morphology as determined by TEM (ASTM D3849) and USAXS. However, particles of this size range do not exist in isolation in silica gel/aerogel. Cabot Aerogel GmbH's aerogel products are manufactured and placed on the market as large (>100 nm) open cellular networks of silica gel.
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - < 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- > 99.7 %
Specific surface area
- Range of specific surface area:
- >= 630 - <= 760 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 12.7 - <= 31 nm
- Percentile:
- D50
- Typical value:
- ca. 9 nm
- Range:
- >= 3 - <= 29 nm
- Percentile:
- D10
- Range:
- >= 7.4 - <= 11 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 50 - <= 430 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 94.41 %
- Range:
- ca. 85 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 2.48 nm
- Range:
- >= 3.19 - <= 49.3 nm
- Percentile:
- D50
- Typical value:
- ca. 3.69 nm
- Range:
- >= 3.69 - <= 61.8 nm
- Percentile:
- D90
- Typical value:
- ca. 6.01 nm
- Range:
- >= 6.01 - <= 80.6 nm
- Percentile:
- D95
- Typical value:
- ca. 6.84 nm
- Range:
- >= 6.84 - <= 87.7 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 90 - <= 100 %
Crystallinity
Structures
- Structure:
- crystalline
- Name:
- Silicon dioxide
- Pure structure:
- yes
- Typical composition:
- <= 0.3 %
- Range:
- >= 0 - <= 0.3 %
- Crystal system:
- other:
Specific surface area
- Typical specific surface area:
- ca. 788 m²/g
- Range of specific surface area:
- >= 29.8 - <= 846.5 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 94.41 %
- Range:
- ca. 85 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D95
- Typical value:
- ca. 6.84 nm
- Range:
- >= 6.84 - <= 87.7 nm
- Percentile:
- D90
- Typical value:
- ca. 6.01 nm
- Range:
- >= 6.01 - <= 80.6 nm
- Percentile:
- D50
- Typical value:
- ca. 3.69 nm
- Range:
- >= 3.69 - <= 61.8 nm
- Percentile:
- D10
- Typical value:
- ca. 2.48 nm
- Range:
- >= 3.19 - <= 49.3 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 90 - <= 100 %
Crystallinity
Structures
- Structure:
- crystalline
- Name:
- Silicon dioxide
- Pure structure:
- yes
- Typical composition:
- <= 0.3 %
- Range:
- > 0 - < 0.3 %
- Crystal system:
- other:
Specific surface area
- Typical specific surface area:
- ca. 788 m²/g
- Range of specific surface area:
- >= 29.8 - <= 846.5 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 1.9 nm
- Range:
- > 1 - < 3.8 nm
- Percentile:
- D50
- Typical value:
- 3.5 nm
- Range:
- > 1.8 - < 5.2 nm
- Percentile:
- D90
- Typical value:
- 6.2 nm
- Range:
- > 4.5 - < 7.9 nm
- Typical aspect ratio (:1):
- 1.3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
Specific surface area
- Typical specific surface area:
- 395 m²/g
- Range of specific surface area:
- > 300 - < 500 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 99.9 %
- Range:
- >= 99.9 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 750 - <= 850 nm
- Percentile:
- D50
- Range:
- >= 300 - <= 400 nm
- Percentile:
- D10
- Range:
- >= 150 - <= 200 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 0 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- >= 99.9 %
- Range:
- >= 99.9 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 150 - <= 300 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 13.7 nm
- Range:
- > 7 - < 20 nm
- Percentile:
- D50
- Typical value:
- ca. 20 nm
- Range:
- > 13 - < 27 nm
- Percentile:
- D90
- Typical value:
- ca. 31.6 nm
- Range:
- > 25 - < 38 nm
- Typical aspect ratio (:1):
- 1.3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- ca. 148 m²/g
- Range of specific surface area:
- > 100 - < 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
Particle size distribution and range
Particle size distribution and range
- Range of length:
- > 10 - < 30 nm
Specific surface area
- Range of specific surface area:
- 154 m²/g
- State Form:
- other: solid; amorphous shards
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
Particle size distribution and range
Particle size distribution and range
- Range of length:
- >= 20 - <= 100 nm
- Range of lateral dimension 1:
- >= 20 - <= 100 nm
- Range of lateral dimension 2:
- >= 20 - <= 100 nm
Specific surface area
- Range of specific surface area:
- ca. 37.2 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
Particle size distribution and range
Particle size distribution and range
- Range of length:
- >= 13.9 - <= 17.8 nm
- Range of lateral dimension 1:
- >= 13.9 - <= 17.8 nm
- Range of lateral dimension 2:
- >= 13.9 - <= 17.8 nm
Surface functionalisation / treatment
- Surface treatment applied:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
Particle size distribution and range
Particle size distribution and range
- Range of length:
- >= 7 - <= 20 nm
- Range of lateral dimension 1:
- >= 7 - <= 20 nm
- Range of lateral dimension 2:
- >= 7 - <= 20 nm
Specific surface area
- Range of specific surface area:
- >= 270 - <= 290 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
Specific surface area
- Range of specific surface area:
- ca. 295 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- other: solid
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- liquid
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Nanoform
| Nanoform |
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
Particle size distribution and range
Particle size distribution and range
- Range of length:
- >= 25 - <= 30 nm
- Range of lateral dimension 1:
- >= 25 - <= 30 nm
- Range of lateral dimension 2:
- >= 25 - <= 30 nm
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- other: amorphous
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Aluminium oxide
- EC Number:
- 215-691-6
- EC Name:
- Aluminium oxide
- CAS Number:
- 1344-28-1
- Molecular formula:
- Al2O3
- IUPAC Name:
- Aluminium oxide
Constituent 2
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Composition(s) generated upon use open all close all
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 8.1 nm
- Range:
- >= 7.6 - <= 8.6 nm
- Percentile:
- D50
- Typical value:
- 10.4 nm
- Range:
- >= 9.9 - < 10.9 nm
- Percentile:
- D90
- Typical value:
- ca. 13.7 nm
- Range:
- >= 13.2 - <= 14.2 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 175 - <= 225 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
Specific surface area
- Range of specific surface area:
- >= 175 - <= 225 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- dioxosilane
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 8.1 nm
- Range:
- >= 7.6 - <= 8.6 nm
- Percentile:
- D50
- Typical value:
- 10.4 nm
- Range:
- >= 9.9 - < 10.9 nm
- Percentile:
- D90
- Typical value:
- ca. 13.7 nm
- Range:
- >= 13.2 - <= 14.2 nm
- Range of length:
- >= <=
- Range of lateral dimension 1:
- >= <=
- Range of lateral dimension 2:
- >= <=
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 175 - <= 225 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
Other types of composition(s)
Information on Registered Substances comes from registration dossiers which have been assigned a registration number. The assignment of a registration number does however not guarantee that the information in the dossier is correct or that the dossier is compliant with Regulation (EC) No 1907/2006 (the REACH Regulation). This information has not been reviewed or verified by the Agency or any other authority. The content is subject to change without prior notice.
Reproduction or further distribution of this information may be subject to copyright protection. Use of the information without obtaining the permission from the owner(s) of the respective information might violate the rights of the owner.
