Registration Dossier
Registration Dossier
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EC number: 203-729-4 | CAS number: 110-02-1
Vapour pressure
Administrative data
- Endpoint:
- vapour pressure
- Type of information:
- experimental study
- Adequacy of study:
- weight of evidence
- Reliability:
- 2 (reliable with restrictions)
- Rationale for reliability incl. deficiencies:
- other: Variety of data sources and peer reviewed data.
Data source
Referenceopen allclose all
- Reference Type:
- review article or handbook
- Title:
- SIDS INITIAL ASSESSMENT PROFILE
- Author:
- OECD
- Year:
- 2 011
- Bibliographic source:
- UNEP publications
- Report date:
- 2011
- Reference Type:
- secondary source
- Title:
- Vapour pressure
- Author:
- Boublik, T., Fried, V., and Hala, E.
- Year:
- 1 984
- Bibliographic source:
- HSDB : Boublik, T., Fried, V., and Hala, E., The Vapour Pressures of Pure Substances. Second Revised Edition. Amsterdam: Elsevier, 1984. Peer Reviewed
Materials and methods
Test guideline
- Qualifier:
- no guideline available
- Principles of method if other than guideline:
- No further details
- GLP compliance:
- not specified
Test material
- Reference substance name:
- Thiophene
- EC Number:
- 203-729-4
- EC Name:
- Thiophene
- Cas Number:
- 110-02-1
- Molecular formula:
- C4H4S
- IUPAC Name:
- thiophene
Constituent 1
Results and discussion
Vapour pressureopen allclose all
- Temp.:
- 25 °C
- Vapour pressure:
- 10 600 Pa
- Remarks on result:
- other: Reference: SIDS Initial assessment report 2011
- Temp.:
- 25 °C
- Vapour pressure:
- 79.7 mm Hg
- Remarks on result:
- other: Reference: Boublik, T. 1984
Applicant's summary and conclusion
- Conclusions:
- The reported vapour pressure value in several sources is 1.06x10^4 Pa.
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