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Please be aware that this old REACH registration data factsheet is no longer maintained; it remains frozen as of 19th May 2023.

The new ECHA CHEM database has been released by ECHA, and it now contains all REACH registration data. There are more details on the transition of ECHA's published data to ECHA CHEM here.

Diss Factsheets

Toxicological information

Acute Toxicity: inhalation

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Administrative data

Endpoint:
acute toxicity: inhalation
Data waiving:
other justification
Justification for data waiving:
the study does not need to be conducted because exposure of humans via inhalation is not likely taking into account the vapour pressure of the substance and/or the possibility of exposure to aerosols, particles or droplets of an inhalable size
Cross-reference
Reason / purpose for cross-reference:
data waiving: supporting information
Reference
Endpoint:
vapour pressure
Type of information:
experimental study
Adequacy of study:
key study
Study period:
From April 26, 2004 to April 28, 2004
Reliability:
2 (reliable with restrictions)
Rationale for reliability incl. deficiencies:
other:
Qualifier:
according to guideline
Guideline:
EU Method A.4 (Vapour Pressure)
Deviations:
no
Qualifier:
according to guideline
Guideline:
OECD Guideline 104 (Vapour Pressure Curve)
Deviations:
no
GLP compliance:
yes
Other quality assurance:
other: This report was inspected by the NOTOX Quality Assurance Unit to confirm that the methods and results accurately and completely reflect the raw data.
Type of method:
static method
Specific details on test material used for the study:
Identification: PARAD Substance 139
Batch: 31104251
Physical state: slightly yellowish viscous liquid
Purity: n.a. (mixture)
Key result
Temp.:
20 °C
Vapour pressure:
0.66 Pa

The first three measurements of the first series, the first two measurements of the second series and the first measurement of the third series were deviating values due to system instability and were not taken into account for the calculations. The results of the vapour pressure calculations are summarised in Table 1 (Refer to PDF under 'Attached background material).

The vapour pressures measured for the test substance at the three test temperatures were all between 1 and 3 Pa. Fitting the data using the least squares method gives a value of 0.659 Pa for the vapour pressure of the test substance at 20°C.

The error for the vapour pressure (p) calculated from the fit was 4.4 %. The deviation between each of the three data points and the fit was < or = 1.8 %. The error made in estimating the mean vapour pressure per temperature series was < or = 0.3%. Taking all these errors into account, a value of 0.04 Pa (i.e. 6.1 %) was found to be reasonable for the uncertainty in the calculated vapour pressure at 20°C.

Conclusions:
Under the study conditions, the vapour pressure of the test substance was determined to be 0.66 ± 0.04 Pa at 20°C (static method).
Executive summary:

A study was conducted to determine the vapour pressure of the test substance, according to EU Method A.4 and OECD guideline 104 (static method).

Static vapour pressure measurements were made with a capacitance manometer fitted with a 133 Pa capacitive sensor. In the static process, at thermodynamic equilibrium, the vapour pressures established in a closed system are determined at three specific temperatures. The measured results (ln p) are plotted versus the reciprocal temperature (in Kelvin) and yield a rectilinear curve for the limited temperature range. The vapour pressure at 20°C was calculated from this curve. A total of 44 measurements were performed.

The vapour pressures measured for the test substance at the three test temperatures were all between 1 and 3 Pa. Fitting the data using the least squares method gives a value of 0.659 Pa for the vapour pressure of the test substance at 20°C.

Therefore, under the study conditions, the vapour pressure of the test substance was determined to be 0.66 ± 0.04 Pa (i.e., 4.9 ± 0.3 x 10-3 mmHg) at 20°C (van der Baan-Teur, 2004).

Data source

Materials and methods

Results and discussion

Applicant's summary and conclusion