Registration Dossier
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EC number: 231-545-4 | CAS number: 7631-86-9 This entry covers synthetic amorphous silicon dioxide as a nanomaterial in the form of stable aggregated particles of particle size > 1 μm, with primary particles of nanosize
General information
Identification
- Display Name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Type of substance
- Composition:
- mono-constituent substance
- Origin:
- inorganic
Total tonnage band
- Total range:
- ≥ 1 000 000 tonnes
REACH
- Registered as:
- FULL
- Submitted:
- Joint Submission
Publication dates
- First published:
- 28-Oct-2009
- Last modified:
- 12-Oct-2020
Chemical safety assessment
- Performed for this substance:
- YES
Compositions open all close all
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: potato shape
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 7 - <= 47 nm
- Percentile:
- D50
- Range:
- >= 9 - <= 63 nm
- Percentile:
- D90
- Range:
- >= 13 - <= 100 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- ca. 200 m²/g
- Range of specific surface area:
- >= 40 - <= 523 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatments
- Surface treatment name:
- silane derivatization
Surface treatmentopen allclose all
- Order:
- #1
- Order:
- #2
- External layer:
- hydrophilic
- Description:
- The silica nanoparticles are silane derivatized by covalent bonding (a condensation reaction) of the hydrolysed organosilanes to the silanols on the surface of the particles. This is done at high temperature (50-90C) and at high pH (9-11), making all the glycidoxypropyl silanes open up to diols (the functionality introduced on the surface of the Levasil CC products). For the Levasil CC 141, CC301 and CC401 products, the glycidoxypropyl silane is the only silane. For the Levasil CC503, a 50/50 molar ratio of glycidoxypropyl and propyl silane is used. No purification of the products is made.
- Percentage of coverage of particle surface, %:
- >= 55 - <= 90
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 94.41 %
- Range:
- ca. 85 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D95
- Typical value:
- ca. 6.84 nm
- Range:
- >= 6.84 - <= 87.7 nm
- Percentile:
- D90
- Typical value:
- ca. 6.01 nm
- Range:
- >= 6.01 - <= 80.6 nm
- Percentile:
- D50
- Typical value:
- ca. 3.69 nm
- Range:
- >= 3.69 - <= 61.8 nm
- Percentile:
- D10
- Typical value:
- ca. 2.48 nm
- Range:
- >= 3.19 - <= 49.3 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 90 - <= 100 %
Crystallinity
Structures
- Structure:
- crystalline
- Name:
- Silicon dioxide
- Pure structure:
- yes
- Typical composition:
- <= 0.3 %
- Range:
- > 0 - < 0.3 %
- Crystal system:
- other:
Specific surface area
- Typical specific surface area:
- ca. 788 m²/g
- Range of specific surface area:
- >= 29.8 - <= 846.5 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 10.2 - <= 103.7 nm
- Percentile:
- D10
- Range:
- >= 5.8 - <= 45.2 nm
- Percentile:
- D50
- Range:
- >= 8 - <= 69 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- other: amorphous
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
Specific surface area
- Range of specific surface area:
- >= 4 - <= 800 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- boundary composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
Particle size distribution and range
Particle size distribution and range
- Range of length:
- > 10 - < 30 nm
Specific surface area
- Range of specific surface area:
- 154 m²/g
- Type:
- legal entity composition of the substance
- State Form:
- liquid
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
Particle size distribution and range
Particle size distribution and range
- Range of length:
- >= 20 - <= 100 nm
- Range of lateral dimension 1:
- >= 20 - <= 100 nm
- Range of lateral dimension 2:
- >= 20 - <= 100 nm
Specific surface area
- Range of specific surface area:
- ca. 37.2 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- > 1 - < 100 nm
- Percentile:
- D25
- Typical value:
- ca. 7.2 nm
- Range:
- >= 5.5 - <= 9.5 nm
- Percentile:
- D50
- Typical value:
- ca. 8.4 nm
- Range:
- >= 5.8 - <= 11.9 nm
- Percentile:
- D75
- Typical value:
- ca. 9.9 nm
- Range:
- >= 7 - <= 14.1 nm
- Percentile:
- D90
- Range:
- > 1 - <= 100 nm
- Typical aspect ratio (:1):
- < 3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Typical specific surface area:
- ca. 297 m²/g
- Range of specific surface area:
- >= 280.8 - <= 299.2 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
Specific surface area
- Range of specific surface area:
- >= 50 - <= 400 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 20 nm
- Percentile:
- D50
- Range:
- >= 20 - <= 45 nm
- Percentile:
- D90
- Range:
- >= 45 - <= 80 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 50 - <= 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- other: solid; amorphous shards
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: potato like
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 12 - <= 42 nm
- Percentile:
- D50
- Range:
- >= 15 - <= 57 nm
- Percentile:
- D90
- Range:
- >= 21 - <= 89 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- >= 200 m²/g
- Range of specific surface area:
- >= 85 - <= 298 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 12.7 - <= 31 nm
- Percentile:
- D50
- Typical value:
- ca. 9 nm
- Range:
- >= 3 - <= 29 nm
- Percentile:
- D10
- Range:
- >= 7.4 - <= 11 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 50 - <= 450 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- boundary composition of the substance
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 14 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 11 - <= 100 nm
- Percentile:
- D10
- Range:
- >= 9 - <= 62 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 20 - <= 280 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
Particle size distribution and range
Particle size distribution and range
- Range of length:
- >= 7 - <= 20 nm
- Range of lateral dimension 1:
- >= 7 - <= 20 nm
- Range of lateral dimension 2:
- >= 7 - <= 20 nm
Specific surface area
- Range of specific surface area:
- >= 270 - <= 290 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 1.9 nm
- Range:
- > 1 - < 3.8 nm
- Percentile:
- D50
- Typical value:
- 3.5 nm
- Range:
- > 1.8 - < 5.2 nm
- Percentile:
- D90
- Typical value:
- 6.2 nm
- Range:
- > 4.5 - < 7.9 nm
- Typical aspect ratio (:1):
- 1.3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
Specific surface area
- Typical specific surface area:
- 395 m²/g
- Range of specific surface area:
- > 300 - < 500 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Typical composition:
- 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- 12.7 nm
- Range:
- >= 1 - <= 15 nm
- Percentile:
- D50
- Typical value:
- 16.5 nm
- Range:
- >= 13 - <= 18 nm
- Percentile:
- D90
- Typical value:
- 20.1
- Range:
- >= 17 - <= 25 nm
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- > 99.7 %
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Typical specific surface area:
- 141.68 m²/g
- Range of specific surface area:
- >= 100 - <= 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 94.41 %
- Range:
- ca. 85 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 2.48 nm
- Range:
- >= 3.19 - <= 49.3 nm
- Percentile:
- D50
- Typical value:
- ca. 3.69 nm
- Range:
- >= 3.69 - <= 61.8 nm
- Percentile:
- D90
- Typical value:
- ca. 6.01 nm
- Range:
- >= 6.01 - <= 80.6 nm
- Percentile:
- D95
- Typical value:
- ca. 6.84 nm
- Range:
- >= 6.84 - <= 87.7 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 90 - <= 100 %
Crystallinity
Structures
- Structure:
- crystalline
- Name:
- Silicon dioxide
- Pure structure:
- yes
- Typical composition:
- <= 0.3 %
- Range:
- >= 0 - <= 0.3 %
- Crystal system:
- other:
Specific surface area
- Typical specific surface area:
- ca. 788 m²/g
- Range of specific surface area:
- >= 29.8 - <= 846.5 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- boundary composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 13.7 nm
- Range:
- > 7 - < 20 nm
- Percentile:
- D50
- Typical value:
- ca. 20 nm
- Range:
- > 13 - < 27 nm
- Percentile:
- D90
- Typical value:
- ca. 31.6 nm
- Range:
- > 25 - < 38 nm
- Typical aspect ratio (:1):
- 1.3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- ca. 148 m²/g
- Range of specific surface area:
- > 100 - < 200 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- boundary composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- 15 - <= 25 nm
- Percentile:
- D50
- Range:
- 13 - <= 20 nm
- Percentile:
- D10
- Range:
- 1 - <= 16 nm
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- 100 - <= 250 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Typical value:
- ca. 14 nm
- Range:
- ca. 14 - ca. 14 nm
- Percentile:
- D50
- Typical value:
- ca. 12 nm
- Range:
- >= 9 - ca. 15 nm
- Percentile:
- D10
- Typical value:
- ca. 9 nm
- Range:
- ca. 9 - ca. 9 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 105 - <= 135 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 99.9 %
- Range:
- >= 99.9 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 750 - <= 850 nm
- Percentile:
- D50
- Range:
- >= 300 - <= 400 nm
- Percentile:
- D10
- Range:
- >= 150 - <= 200 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 0 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- >= 99.9 %
- Range:
- >= 99.9 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 150 - <= 300 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatmentsopen allclose all
- Surface treatment name:
- SAS Silanized
Surface treatment
- Order:
- #1
- External layer:
- hydrophobic
- Description:
- The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
- Percentage of coverage of particle surface, %:
- >= 30 - < 100
- Surface treatment name:
- CAS 75-78-5
Surface treatmentopen allclose all
- Order:
- #2
- Order:
- #3
- Order:
- #4
- Order:
- #5
- Order:
- #6
- Order:
- #7
- Order:
- #8
- Order:
- #9
- Order:
- #10
- Order:
- #11
- External layer:
- hydrophobic
- Description:
- Reaction of SAS with dichloro(dimethyl)silane, CAS 75-78-5. Typical carbon content below 10%.
Examples H15 grade 0.8-1.2 % C; H18 grade 4.0-5.2 % C (highest carbon content). - Percentage of coverage of particle surface, %:
- >= 30 - < 100
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Typical composition:
- > 99 %
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 4 - <= 10 nm
- Percentile:
- D50
- Range:
- >= 10 - <= 25 nm
- Percentile:
- D90
- Range:
- > 12 - <= 35 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- ca. 1 :1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 95 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- Amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 44 - <= 330 m²/g
- Range of volume specific surface area:
- >= 96.8 - <= 726 m²/cm³
- Skeletal density:
- ca. 2.2 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
Particle size distribution and range
Particle size distribution and range
- Range of length:
- >= 30 - <= 80 nm
- Range of lateral dimension 1:
- >= 30 - <= 80 nm
- Range of lateral dimension 2:
- >= 30 - <= 80 nm
Specific surface area
- Range of specific surface area:
- >= 50 - <= 150 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 1 000 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: potato shape
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 8 - <= 38 nm
- Percentile:
- D50
- Range:
- >= 10 - <= 54 nm
- Percentile:
- D90
- Range:
- >= 15 - <= 82 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
Specific surface area
- Typical specific surface area:
- >= 200 m²/g
- Range of specific surface area:
- >= 104 - <= 906 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- yes
- Does the set contain both treated and non-surface treated nanoforms?:
- no
Surface treatments
- Surface treatment name:
- aluminusilicate modified
Surface treatmentopen allclose all
- Order:
- #1
- Order:
- #2
- External layer:
- hydrophilic
- Description:
- Aluminate modification:
A diluted (about 10 X; contains 2-3 wt% NaAlO2) solution of sodium aluminate is added to a colloidal silica base sol slowly (30-60 min) under stirring at 50-100 C. The pH at the start of the modification differs, but the end-pH is always alkaline, 9.5-10.5.
When the aluminate modification is done, only filtration of the products is made, no extra purification step.
The molar ratio is dependent on which product that is aluminate modified, a typical SiO2:Al2O3 is in the order of 300:1 in the final aluminate modified CS.
The formed groups on the silica surface are named aluminosilicate groups. The term “alumino” means that the aluminium is four-coordinated in the silica structure. This can experimentally be verified by using 27Al-NMR.
Cationic modification:
Basic aluminium chloride is diluted with water and some acetic acid or citric acid is added and the mix is stirred for 1-2 h. Colloidal silica is then slowly dosed to this mixture under stirring for 3-5 h at room temperature. Optionally, the resulting product can be heated to 40-50 C. The resulting pH of the cationic product is about 3.7. After the modification, the resulting product is filtered. No further purification step is made. In the modification process, polycations in the basic aluminium chloride solution, with the typical composition Al13O4(OH)24(H2O)12 reverse the charge of the negatively silica particles as they are dosed into the solution. The resulting product has a positive surface charge and has a surface layer consisting of aluminium oxide hydroxide species.
The typical molar ratio SiO2:Al2O3 in cationic CS products is 10-15:1. The surface layer of the cationic CS consists of aluminium oxide hydroxide species. - Percentage of coverage of particle surface, %:
- >= 5 - <= 100
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D25
- Typical value:
- ca. 3.5 nm
- Range:
- >= 1.9 - <= 5.3 nm
- Percentile:
- D50
- Typical value:
- ca. 4.3 nm
- Range:
- >= 1.8 - <= 7.3 nm
- Percentile:
- D75
- Typical value:
- ca. 5.2 nm
- Range:
- >= 2.3 - <= 8.9 nm
- Percentile:
- D90
- Range:
- >= 1 - < 100 nm
- Typical aspect ratio (:1):
- < 3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Typical specific surface area:
- ca. 673 m²/g
- Range of specific surface area:
- >= 609.4 - <= 674.6 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D50
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are spherical in nature.
- Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Range:
- > 99.7 - <= 100 %
- Description:
- X-Ray diffractograms of the manufactured mixture show no peaks relating to crystalline silicon dioxide.
Specific surface area
- Range of specific surface area:
- >= 4 - <= 800 m²/g
- Range of volume specific surface area:
- >= 8.8 - <= 2 200 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Typical composition:
- ca. 99.7 %
- Range:
- >= 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- ca. 15 nm
- Range:
- >= 0 - <= 20 nm
- Percentile:
- D50
- Typical value:
- ca. 23 nm
- Range:
- >= 0 - <= 60 nm
- Percentile:
- D90
- Typical value:
- ca. 46 nm
- Range:
- >= 30 - <= 60 nm
- Typical length:
- ca. 23 nm
- Range of length:
- >= 1 - <= 100 nm
- Typical lateral dimension 1:
- ca. 23 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Typical lateral dimension 2:
- ca. 23 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- ca. 1 :1
- Range of aspect ratio (:1):
- >= 1 - <= 1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
As shape is spheroidal, Typical lateral dimension 1, Typical lateral dimension 2 are equal to Typical Length . Typical Length is d50 value.
As shape is spheroidal, Typical aspect ration is 1 (the substance is not in fiber form).
Please see report 2020.075 - SID 17211. (ex batch number I044458101) - Fraction of constituent particles in the size range 1-100 nm:
- > 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- > 99.7 %
- Range:
- > 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
For concerned substance, please see reports HSL report_June 2018 / Laboratory number 1801858 LEVILITE Precipitated amorphous silica p3, 2020.075 - SID 17211 and ECETOC2006_2-3-1_xray.
Specific surface area
- Typical specific surface area:
- ca. 528 m²/g
- Range of specific surface area:
- >= 200 - <= 700 m²/g
- Typical volume specific surface area:
- ca. 1 104 m²/cm³
- Range of volume specific surface area:
- >= 400 - <= 1 500 m²/cm³
- Skeletal density:
- >= 1.7 - <= 2.25 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 12.7 - <= 31 nm
- Percentile:
- D50
- Typical value:
- ca. 9 nm
- Range:
- >= 3 - <= 29 nm
- Percentile:
- D10
- Range:
- >= 7.4 - <= 11 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 50 - <= 430 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: particulate/powder
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Remarks:
- ND and Z1, primary particle shape: 100% spherical particles with regular shape.
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- ca. 100 %
- Range:
- ca. 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
- Remarks:
- ND and Z1
Percentileopen allclose all
- Percentile:
- D10
- Typical value:
- >= 1.2 nm
- Range:
- >= 0.5 - <= 10 nm
- Percentile:
- D50
- Typical value:
- >= 2.9 nm
- Range:
- >= 2 - <= 14 nm
- Percentile:
- D90
- Typical value:
- >= 11 nm
- Range:
- >= 5 - <= 40 nm
- Typical aspect ratio (:1):
- ca. 1 :1
- Additional information:
- According to the TEM image and histogram, ND type Quartzene material’s particle dize varies between 1 to 20 nm where as the majority of the particles are below 10 nm in size.
As it can be seen from the TEM analysis, Z1 type Quartzene material’s particle size varies between 5 to 20 nm in the image and it should be mentioned that the analytical sample is an example of the Z1 particles on the TEM grid, different parts of the same gird may have different particles and the particle size can vary between 10 to 30 nm in size. - Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- amorphous
- Pure structure:
- yes
- Typical composition:
- >= 99.7 %
- Range:
- >= 99.7 - <= 100 %
- Crystal system:
- not applicable
- Description:
- Z1 and ND is 100% amorphous (< 0,3 % crystalline parts). X-ray diffraction diagrams of ND/Z1 show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below. please see XRD-analysis for confirmation.
Specific surface area
- Typical specific surface area:
- >= 279 m²/g
- Range of specific surface area:
- >= 122 - <= 556 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- single nanoform
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Typical composition:
- 100 %
- Range:
- >= 95 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 1 - <= 100 nm
- Percentile:
- D25
- Typical value:
- ca. 5.8 nm
- Range:
- >= 4.1 - <= 7.5 nm
- Percentile:
- D50
- Typical value:
- ca. 6.8 nm
- Range:
- >= 4.3 - <= 9.3 nm
- Percentile:
- D75
- Typical value:
- ca. 8.1 nm
- Range:
- >= 5.2 - <= 11 nm
- Percentile:
- D90
- Range:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- < 3 :1
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Typical composition:
- ca. 100 %
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Typical specific surface area:
- ca. 310 m²/g
- Range of specific surface area:
- >= 216.2 - <= 312.5 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: 3-dimensional branched fractal aggregates
- Pure shape:
- yes
- Typical composition:
- > 99 %
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 4 - <= 10 nm
- Percentile:
- D50
- Range:
- >= 10 - <= 20 nm
- Percentile:
- D90
- Range:
- > 12 - <= 30 nm
- Range of length:
- >= 1 - <= 100 nm
- Range of lateral dimension 1:
- >= 1 - <= 100 nm
- Range of lateral dimension 2:
- >= 1 - <= 100 nm
- Typical aspect ratio (:1):
- ca. 1 :1
- Additional information:
- The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
- Fraction of constituent particles in the size range 1-100 nm:
- > 95 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Name:
- Amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
- Description:
- X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.
Specific surface area
- Range of specific surface area:
- >= 70 - <= 330 m²/g
- Range of volume specific surface area:
- >= 154 - <= 726 m²/cm³
- Skeletal density:
- ca. 2.2 g/cm³
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
Constituent 1
- Reference substance name:
- Aluminium oxide
- EC Number:
- 215-691-6
- EC Name:
- Aluminium oxide
- CAS Number:
- 1344-28-1
- Molecular formula:
- Al2O3
- IUPAC Name:
- Aluminium oxide
Constituent 2
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Cross-reference
- Reason / purpose:
- justification for reporting set of similar nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- spherical
- Pure shape:
- yes
- Range:
- > 99 - <= 100 %
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D90
- Range:
- >= 12.7 - <= 24 nm
- Percentile:
- D50
- Range:
- >= 9.4 - <= 16 nm
- Percentile:
- D10
- Range:
- >= 7.4 - <= 9 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 50 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Range:
- >= 99.7 - <= 100 %
Specific surface area
- Range of specific surface area:
- >= 75 - <= 420 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
Specific surface area
- Range of specific surface area:
- ca. 295 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Type:
- legal entity composition of the substance
- State Form:
- solid: bulk
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
- Type:
- legal entity composition of the substance
- State Form:
- solid: nanoform
Constituent 1
- Reference substance name:
- Silicon dioxide
- EC Number:
- 231-545-4
- EC Name:
- Silicon dioxide
- CAS Number:
- 7631-86-9
- Molecular formula:
- O2Si
- IUPAC Name:
- Silicon dioxide
Characterisation of nanoforms
- Type of information reported:
- set of nanoforms
Shape
Shape description
- Shape category:
- spheroidal
- Shape:
- other: potato shape
- Pure shape:
- yes
Particle size distribution and range
Particle size distribution and range
- Shape category:
- spheroidal
Percentileopen allclose all
- Percentile:
- D10
- Range:
- >= 7 - <= 50 nm
- Percentile:
- D50
- Range:
- >= 9 - <= 67 nm
- Percentile:
- D90
- Range:
- >= 13 - <= 100 nm
- Fraction of constituent particles in the size range 1-100 nm:
- >= 99.9 - <= 100 %
Crystallinity
Structures
- Structure:
- amorphous
- Pure structure:
- yes
- Crystal system:
- not applicable
Specific surface area
- Typical specific surface area:
- ca. 200 m²/g
- Range of specific surface area:
- >= 79 - <= 523 m²/g
Surface functionalisation / treatment
- Surface treatment applied:
- no
- Does the set contain both treated and non-surface treated nanoforms?:
- no