silicon dioxide; synthetic amorphous silicon dioxide (nano)

Substance identity

Identification

Display Name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Type of Substance

Composition:

mono-constituent substance

Origin:

inorganic

Substance Identifiers

Trade name

EQ-Pak

Silica Gel

Sorb-it

White Gel

Compositions

Boundary Composition(s)

synthetic amorphous silica, nanostructured material_Set 1

Nanoform

State Form:

solid: nanoform

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Characterisation of nanoforms

Type of information reported:

set of nanoforms

Name of set of nanoforms:

Snythetic amorphous silicon dioxide, nanostructured material_Set1

Cross-reference

Reason / purpose:

justification for reporting set of similar nanoforms

Shape

Shape description

Shape category:

spheroidal

Shape:

other: 3-dimensional branched fractal aggregates

Pure shape:

yes

Range:

>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range

Shape category:

spheroidal

Percentile

Percentile 1

Percentile:

D10

Range:

>= 1 - <= 100 nm

Percentile 2

Percentile:

D50

Range:

>= 1 - <= 100 nm

Percentile 3

Percentile:

D90

Range:

>= 1 - <= 100 nm

Additional information:

The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.

Fraction of constituent particles in the size range 1-100 nm:

> 50 - <= 100 %

Crystallinity

Structures

Structure:

amorphous

Name:

amorphous

Pure structure:

yes

Range:

> 99.7 - <= 100 %

Description:

X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:

>= 4 - <= 1 000 m²/g

Range of volume specific surface area:

>= 8.8 - <= 2 200 m²/cm³

Skeletal density:

>= 1.7 - <= 2.25 g/cm³

Surface functionalisation / treatment

Surface treatment applied:

no

Legal Entity Composition(s)

synthetic amorphous silica, nanostructured material

Nanoform

State Form:

solid: nanoform

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Characterisation of nanoforms

Type of information reported:

set of nanoforms

Name of nanoform:

WACKER Fumed SAS

Name of set of nanoforms:

Set 1

Cross-reference

Reason / purpose:

justification for reporting set of similar nanoforms

Shape

Shape description

Shape category:

spheroidal

Shape:

other: 3-dimensional branched fractal aggregates

Pure shape:

yes

Range:

>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range

Shape category:

spheroidal

Percentile

Percentile 1

Percentile:

D10

Range:

>= 1 - <= 100 nm

Percentile 2

Percentile:

D50

Range:

>= 1 - <= 100 nm

Percentile 3

Percentile:

D90

Range:

>= 1 - <= 100 nm

Range of length:

>= 1 - <= 100 nm

Range of lateral dimension 1:

>= 1 - <= 100 nm

Range of lateral dimension 2:

>= 1 - <= 100 nm

Range of aspect ratio (:1):

>= 1 - <= 1

Additional information:

The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.

Fraction of constituent particles in the size range 1-100 nm:

> 50 - <= 100 %

Crystallinity

Structures

Structure:

amorphous

Name:

amorphous

Pure structure:

yes

Range:

> 99.7 - <= 100 %

Description:

X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:

>= 4 - <= 1 000 m²/g

Range of volume specific surface area:

>= 8.8 - <= 2 200 m²/cm³

Skeletal density:

>= 1.7 - <= 2.25 g/cm³

Surface functionalisation / treatment

Surface treatment applied:

no

synthetic amorphous silica, nanostructured material

Nanoform

State Form:

solid: nanoform

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Characterisation of nanoforms

Type of information reported:

set of nanoforms

Name of nanoform:

WACKER Precipitated SAS

Name of set of nanoforms:

Set 1

Cross-reference

Reason / purpose:

justification for reporting set of similar nanoforms

Shape

Shape description

Shape category:

spheroidal

Shape:

other: 3-dimensional branched fractal aggregates

Pure shape:

yes

Range:

>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range

Shape category:

spheroidal

Percentile

Percentile 1

Percentile:

D10

Range:

>= 1 - <= 100 nm

Percentile 2

Percentile:

D50

Range:

>= 1 - <= 100 nm

Percentile 3

Percentile:

D90

Range:

>= 1 - <= 100 nm

Range of length:

>= 1 - <= 100 nm

Range of lateral dimension 1:

>= 1 - <= 100 nm

Range of lateral dimension 2:

>= 1 - <= 100 nm

Range of aspect ratio (:1):

>= 1 - <= 1

Additional information:

The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.

Fraction of constituent particles in the size range 1-100 nm:

> 50 - <= 100 %

Crystallinity

Structures

Structure:

amorphous

Name:

amorphous

Pure structure:

yes

Range:

> 99.7 - <= 100 %

Description:

X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:

>= 4 - <= 1 000 m²/g

Range of volume specific surface area:

>= 8.8 - <= 2 200 m²/cm³

Skeletal density:

>= 1.7 - <= 2.25 g/cm³

Surface functionalisation / treatment

Surface treatment applied:

no

silicon dioxide

State Form:

solid: particulate/powder

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Silicon dioxide

State Form:

solid: particulate/powder

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Silicon dioxide

State Form:

solid: particulate/powder

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

silicon dioxide; synthetic amorphous silicon dioxide (nano)

State Form:

solid: particulate/powder

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Silicon dioxide

State Form:

solid: particulate/powder

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Silica, amorphous, pyrogenic, crystalline-free

State Form:

solid: particulate/powder

Constituent 1

Reference substance name:

Silica, amorphous, pyrogenic, crystalline-free

CAS Number:

112945-52-5

Molecular formula:

O2Si

IUPAC Name:

Silica, amorphous, pyrogenic, crystalline-free

CAS-Name: Silica gel, precipitated [CAS-No. 112926-00-8]

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

CAS-Name: Silica, amorphous, fumed, crystalline-free [CAS-No. 112945-52-5]

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Silicon dioxide

Constituent 1

Reference substance name:

Silicon dioxide

EC Number:

231-545-4

EC Name:

Silicon dioxide

CAS Number:

7631-86-9

Molecular formula:

O2Si

IUPAC Name:

Silicon dioxide

Composition(s) generated upon use

Other types of composition(s)