Registration Dossier

Identification

Chemical structure
Display Name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Type of substance

Composition:
mono-constituent substance
Origin:
inorganic

Total tonnage band

Total range:
≥ 1 000 000 tonnes

REACH

Registered as:
FULL
Submitted:
Joint Submission

Publication dates

First published:
28-Oct-2009
Last modified:
12-Oct-2020

Chemical safety assessment

Performed for this substance:
YES

Compositions open all close all

Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: bulk


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: potato shape
Pure shape:
yes

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 7 - <= 47 nm
Percentile:
D50
Range:
>= 9 - <= 63 nm
Percentile:
D90
Range:
>= 13 - <= 100 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 99.9 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes

Specific surface area

Typical specific surface area:
ca. 200 m²/g
Range of specific surface area:
>= 40 - <= 523 m²/g

Surface functionalisation / treatment

Surface treatment applied:
yes
Does the set contain both treated and non-surface treated nanoforms?:
no
Surface treatments
Surface treatment name:
silane derivatization
Surface treatmentopen allclose all
External layer:
hydrophilic
Description:
The silica nanoparticles are silane derivatized by covalent bonding (a condensation reaction) of the hydrolysed organosilanes to the silanols on the surface of the particles. This is done at high temperature (50-90C) and at high pH (9-11), making all the glycidoxypropyl silanes open up to diols (the functionality introduced on the surface of the Levasil CC products). For the Levasil CC 141, CC301 and CC401 products, the glycidoxypropyl silane is the only silane. For the Levasil CC503, a 50/50 molar ratio of glycidoxypropyl and propyl silane is used. No purification of the products is made.
Percentage of coverage of particle surface, %:
>= 55 - <= 90
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Typical composition:
ca. 94.41 %
Range:
ca. 85 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D95
Typical value:
ca. 6.84 nm
Range:
>= 6.84 - <= 87.7 nm
Percentile:
D90
Typical value:
ca. 6.01 nm
Range:
>= 6.01 - <= 80.6 nm
Percentile:
D50
Typical value:
ca. 3.69 nm
Range:
>= 3.69 - <= 61.8 nm
Percentile:
D10
Typical value:
ca. 2.48 nm
Range:
>= 3.19 - <= 49.3 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 90 - <= 100 %

Crystallinity

Structures
Structure:
crystalline
Name:
Silicon dioxide
Pure structure:
yes
Typical composition:
<= 0.3 %
Range:
> 0 - < 0.3 %
Crystal system:
other:

Specific surface area

Typical specific surface area:
ca. 788 m²/g
Range of specific surface area:
>= 29.8 - <= 846.5 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: bulk


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Range:
>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D90
Range:
>= 10.2 - <= 103.7 nm
Percentile:
D10
Range:
>= 5.8 - <= 45.2 nm
Percentile:
D50
Range:
>= 8 - <= 69 nm
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
Fraction of constituent particles in the size range 1-100 nm:
> 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Range:
> 99.7 - <= 100 %
Description:
X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:
>= 4 - <= 1 000 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
other: amorphous


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Specific surface area

Range of specific surface area:
>= 4 - <= 800 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
boundary composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Specific surface area

Range of specific surface area:
>= 4 - <= 1 000 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Particle size distribution and range

Particle size distribution and range
Range of length:
> 10 - < 30 nm

Specific surface area

Range of specific surface area:
154 m²/g
Type:
legal entity composition of the substance
State Form:
liquid


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Particle size distribution and range

Particle size distribution and range
Range of length:
>= 20 - <= 100 nm
Range of lateral dimension 1:
>= 20 - <= 100 nm
Range of lateral dimension 2:
>= 20 - <= 100 nm

Specific surface area

Range of specific surface area:
ca. 37.2 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: bulk


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Typical composition:
100 %
Range:
>= 95 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
> 1 - < 100 nm
Percentile:
D25
Typical value:
ca. 7.2 nm
Range:
>= 5.5 - <= 9.5 nm
Percentile:
D50
Typical value:
ca. 8.4 nm
Range:
>= 5.8 - <= 11.9 nm
Percentile:
D75
Typical value:
ca. 9.9 nm
Range:
>= 7 - <= 14.1 nm
Percentile:
D90
Range:
> 1 - <= 100 nm
Typical aspect ratio (:1):
< 3 :1
Fraction of constituent particles in the size range 1-100 nm:
>= 99 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Typical composition:
ca. 100 %
Range:
>= 99.7 - <= 100 %

Specific surface area

Typical specific surface area:
ca. 297 m²/g
Range of specific surface area:
>= 280.8 - <= 299.2 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Specific surface area

Range of specific surface area:
>= 50 - <= 400 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Range:
>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 1 - <= 20 nm
Percentile:
D50
Range:
>= 20 - <= 45 nm
Percentile:
D90
Range:
>= 45 - <= 80 nm
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
Fraction of constituent particles in the size range 1-100 nm:
> 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
amorphous
Pure structure:
yes
Range:
> 99.7 - <= 100 %
Description:
X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:
>= 50 - <= 200 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
other: solid; amorphous shards


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: potato like
Pure shape:
yes

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 12 - <= 42 nm
Percentile:
D50
Range:
>= 15 - <= 57 nm
Percentile:
D90
Range:
>= 21 - <= 89 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 99.9 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes

Specific surface area

Typical specific surface area:
>= 200 m²/g
Range of specific surface area:
>= 85 - <= 298 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Range:
> 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D90
Range:
>= 12.7 - <= 31 nm
Percentile:
D50
Typical value:
ca. 9 nm
Range:
>= 3 - <= 29 nm
Percentile:
D10
Range:
>= 7.4 - <= 11 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Range:
>= 99.7 - <= 100 %

Specific surface area

Range of specific surface area:
>= 50 - <= 450 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
boundary composition of the substance
State Form:
solid: bulk


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Range:
> 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D90
Range:
>= 14 - <= 100 nm
Percentile:
D50
Range:
>= 11 - <= 100 nm
Percentile:
D10
Range:
>= 9 - <= 62 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Range:
>= 99.7 - <= 100 %

Specific surface area

Range of specific surface area:
>= 20 - <= 280 m²/g

Surface functionalisation / treatment

Surface treatment applied:
yes
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Particle size distribution and range

Particle size distribution and range
Range of length:
>= 7 - <= 20 nm
Range of lateral dimension 1:
>= 7 - <= 20 nm
Range of lateral dimension 2:
>= 7 - <= 20 nm

Specific surface area

Range of specific surface area:
>= 270 - <= 290 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: bulk


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Typical composition:
<= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Typical value:
1.9 nm
Range:
> 1 - < 3.8 nm
Percentile:
D50
Typical value:
3.5 nm
Range:
> 1.8 - < 5.2 nm
Percentile:
D90
Typical value:
6.2 nm
Range:
> 4.5 - < 7.9 nm
Typical aspect ratio (:1):
1.3 :1
Fraction of constituent particles in the size range 1-100 nm:
>= 99 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Typical composition:
ca. 100 %

Specific surface area

Typical specific surface area:
395 m²/g
Range of specific surface area:
> 300 - < 500 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Typical composition:
100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Typical value:
12.7 nm
Range:
>= 1 - <= 15 nm
Percentile:
D50
Typical value:
16.5 nm
Range:
>= 13 - <= 18 nm
Percentile:
D90
Typical value:
20.1
Range:
>= 17 - <= 25 nm
Fraction of constituent particles in the size range 1-100 nm:
> 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
amorphous
Pure structure:
yes
Typical composition:
> 99.7 %
Range:
> 99.7 - <= 100 %
Description:
X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Typical specific surface area:
141.68 m²/g
Range of specific surface area:
>= 100 - <= 200 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Typical composition:
ca. 94.41 %
Range:
ca. 85 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Typical value:
ca. 2.48 nm
Range:
>= 3.19 - <= 49.3 nm
Percentile:
D50
Typical value:
ca. 3.69 nm
Range:
>= 3.69 - <= 61.8 nm
Percentile:
D90
Typical value:
ca. 6.01 nm
Range:
>= 6.01 - <= 80.6 nm
Percentile:
D95
Typical value:
ca. 6.84 nm
Range:
>= 6.84 - <= 87.7 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 90 - <= 100 %

Crystallinity

Structures
Structure:
crystalline
Name:
Silicon dioxide
Pure structure:
yes
Typical composition:
<= 0.3 %
Range:
>= 0 - <= 0.3 %
Crystal system:
other:

Specific surface area

Typical specific surface area:
ca. 788 m²/g
Range of specific surface area:
>= 29.8 - <= 846.5 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
boundary composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Range:
>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 1 - <= 100 nm
Percentile:
D50
Range:
>= 1 - <= 100 nm
Percentile:
D90
Range:
>= 1 - <= 100 nm
Range of length:
>= 1 - <= 100 nm
Range of lateral dimension 1:
>= 1 - <= 100 nm
Range of lateral dimension 2:
>= 1 - <= 100 nm
Range of aspect ratio (:1):
>= 1 - <= 1
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
Fraction of constituent particles in the size range 1-100 nm:
> 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Range:
> 99.7 - <= 100 %
Description:
In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:
>= 4 - <= 1 000 m²/g
Range of volume specific surface area:
>= 8.8 - <= 2 200 m²/cm³
Skeletal density:
>= 1.7 - <= 2.25 g/cm³

Surface functionalisation / treatment

Surface treatment applied:
yes
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: bulk


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Typical composition:
<= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Typical value:
ca. 13.7 nm
Range:
> 7 - < 20 nm
Percentile:
D50
Typical value:
ca. 20 nm
Range:
> 13 - < 27 nm
Percentile:
D90
Typical value:
ca. 31.6 nm
Range:
> 25 - < 38 nm
Typical aspect ratio (:1):
1.3 :1
Fraction of constituent particles in the size range 1-100 nm:
>= 99 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes

Specific surface area

Typical specific surface area:
ca. 148 m²/g
Range of specific surface area:
> 100 - < 200 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: bulk


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
boundary composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Range:
>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 1 - <= 100 nm
Percentile:
D50
Range:
>= 1 - <= 100 nm
Percentile:
D90
Range:
>= 1 - <= 100 nm
Range of length:
>= 1 - <= 100 nm
Range of lateral dimension 1:
>= 1 - <= 100 nm
Range of lateral dimension 2:
>= 1 - <= 100 nm
Range of aspect ratio (:1):
>= 1 - <= 1
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
Fraction of constituent particles in the size range 1-100 nm:
> 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
amorphous
Pure structure:
yes
Range:
> 99.7 - <= 100 %
Description:
X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:
>= 4 - <= 1 000 m²/g
Range of volume specific surface area:
>= 8.8 - <= 2 200 m²/cm³
Skeletal density:
>= 1.7 - <= 2.25 g/cm³

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D90
Range:
15 - <= 25 nm
Percentile:
D50
Range:
13 - <= 20 nm
Percentile:
D10
Range:
1 - <= 16 nm
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.


Fraction of constituent particles in the size range 1-100 nm:
50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
amorphous
Pure structure:
yes
Range:
> 99.7 - <= 100 %
Description:
X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:
100 - <= 250 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Range:
> 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D90
Typical value:
ca. 14 nm
Range:
ca. 14 - ca. 14 nm
Percentile:
D50
Typical value:
ca. 12 nm
Range:
>= 9 - ca. 15 nm
Percentile:
D10
Typical value:
ca. 9 nm
Range:
ca. 9 - ca. 9 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Range:
>= 99.7 - <= 100 %

Specific surface area

Range of specific surface area:
>= 105 - <= 135 m²/g

Surface functionalisation / treatment

Surface treatment applied:
yes
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Typical composition:
ca. 99.9 %
Range:
>= 99.9 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D90
Range:
>= 750 - <= 850 nm
Percentile:
D50
Range:
>= 300 - <= 400 nm
Percentile:
D10
Range:
>= 150 - <= 200 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 0 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Typical composition:
>= 99.9 %
Range:
>= 99.9 - <= 100 %

Specific surface area

Range of specific surface area:
>= 150 - <= 300 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Range:
>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 1 - <= 100 nm
Percentile:
D50
Range:
>= 1 - <= 100 nm
Percentile:
D90
Range:
>= 1 - <= 100 nm
Range of length:
>= 1 - <= 100 nm
Range of lateral dimension 1:
>= 1 - <= 100 nm
Range of lateral dimension 2:
>= 1 - <= 100 nm
Range of aspect ratio (:1):
>= 1 - <= 1
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
Fraction of constituent particles in the size range 1-100 nm:
> 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Range:
> 99.7 - <= 100 %
Description:
In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:
>= 4 - <= 1 000 m²/g
Range of volume specific surface area:
>= 8.8 - <= 2 200 m²/cm³
Skeletal density:
>= 1.7 - <= 2.25 g/cm³

Surface functionalisation / treatment

Surface treatment applied:
yes
Does the set contain both treated and non-surface treated nanoforms?:
no
Surface treatmentsopen allclose all
Surface treatment name:
SAS Silanized
Surface treatment
Order:
#1
External layer:
hydrophobic
Description:
The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
Percentage of coverage of particle surface, %:
>= 30 - < 100
Surface treatment name:
CAS 75-78-5
Surface treatmentopen allclose all
External layer:
hydrophobic
Description:
Reaction of SAS with dichloro(dimethyl)silane, CAS 75-78-5. Typical carbon content below 10%.
Examples H15 grade 0.8-1.2 % C; H18 grade 4.0-5.2 % C (highest carbon content).
Percentage of coverage of particle surface, %:
>= 30 - < 100
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Typical composition:
> 99 %
Range:
> 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 4 - <= 10 nm
Percentile:
D50
Range:
>= 10 - <= 25 nm
Percentile:
D90
Range:
> 12 - <= 35 nm
Range of length:
>= 1 - <= 100 nm
Range of lateral dimension 1:
>= 1 - <= 100 nm
Range of lateral dimension 2:
>= 1 - <= 100 nm
Typical aspect ratio (:1):
ca. 1 :1
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
Fraction of constituent particles in the size range 1-100 nm:
> 95 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
Amorphous
Pure structure:
yes
Range:
>= 99.7 - <= 100 %
Description:
X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:
>= 44 - <= 330 m²/g
Range of volume specific surface area:
>= 96.8 - <= 726 m²/cm³
Skeletal density:
ca. 2.2 g/cm³

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Particle size distribution and range

Particle size distribution and range
Range of length:
>= 30 - <= 80 nm
Range of lateral dimension 1:
>= 30 - <= 80 nm
Range of lateral dimension 2:
>= 30 - <= 80 nm

Specific surface area

Range of specific surface area:
>= 50 - <= 150 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Range:
>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 1 - <= 100 nm
Percentile:
D50
Range:
>= 1 - <= 100 nm
Percentile:
D90
Range:
>= 1 - <= 100 nm
Range of length:
>= 1 - <= 100 nm
Range of lateral dimension 1:
>= 1 - <= 100 nm
Range of lateral dimension 2:
>= 1 - <= 100 nm
Range of aspect ratio (:1):
>= 1 - <= 1
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
Fraction of constituent particles in the size range 1-100 nm:
> 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
amorphous
Pure structure:
yes
Range:
> 99.7 - <= 100 %
Description:
X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:
>= 4 - <= 1 000 m²/g
Range of volume specific surface area:
>= 8.8 - <= 2 200 m²/cm³
Skeletal density:
>= 1.7 - <= 2.25 g/cm³

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: potato shape
Pure shape:
yes

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 8 - <= 38 nm
Percentile:
D50
Range:
>= 10 - <= 54 nm
Percentile:
D90
Range:
>= 15 - <= 82 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 99.9 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes

Specific surface area

Typical specific surface area:
>= 200 m²/g
Range of specific surface area:
>= 104 - <= 906 m²/g

Surface functionalisation / treatment

Surface treatment applied:
yes
Does the set contain both treated and non-surface treated nanoforms?:
no
Surface treatments
Surface treatment name:
aluminusilicate modified
Surface treatmentopen allclose all
External layer:
hydrophilic
Description:
Aluminate modification:
A diluted (about 10 X; contains 2-3 wt% NaAlO2) solution of sodium aluminate is added to a colloidal silica base sol slowly (30-60 min) under stirring at 50-100 C. The pH at the start of the modification differs, but the end-pH is always alkaline, 9.5-10.5.
When the aluminate modification is done, only filtration of the products is made, no extra purification step.
The molar ratio is dependent on which product that is aluminate modified, a typical SiO2:Al2O3 is in the order of 300:1 in the final aluminate modified CS.
The formed groups on the silica surface are named aluminosilicate groups. The term “alumino” means that the aluminium is four-coordinated in the silica structure. This can experimentally be verified by using 27Al-NMR.

Cationic modification:
Basic aluminium chloride is diluted with water and some acetic acid or citric acid is added and the mix is stirred for 1-2 h. Colloidal silica is then slowly dosed to this mixture under stirring for 3-5 h at room temperature. Optionally, the resulting product can be heated to 40-50 C. The resulting pH of the cationic product is about 3.7. After the modification, the resulting product is filtered. No further purification step is made. In the modification process, polycations in the basic aluminium chloride solution, with the typical composition Al13O4(OH)24(H2O)12 reverse the charge of the negatively silica particles as they are dosed into the solution. The resulting product has a positive surface charge and has a surface layer consisting of aluminium oxide hydroxide species.
The typical molar ratio SiO2:Al2O3 in cationic CS products is 10-15:1. The surface layer of the cationic CS consists of aluminium oxide hydroxide species.
Percentage of coverage of particle surface, %:
>= 5 - <= 100
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Typical composition:
100 %
Range:
>= 95 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 1 - <= 100 nm
Percentile:
D25
Typical value:
ca. 3.5 nm
Range:
>= 1.9 - <= 5.3 nm
Percentile:
D50
Typical value:
ca. 4.3 nm
Range:
>= 1.8 - <= 7.3 nm
Percentile:
D75
Typical value:
ca. 5.2 nm
Range:
>= 2.3 - <= 8.9 nm
Percentile:
D90
Range:
>= 1 - < 100 nm
Typical aspect ratio (:1):
< 3 :1
Fraction of constituent particles in the size range 1-100 nm:
>= 99 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Typical composition:
ca. 100 %
Range:
>= 99.7 - <= 100 %

Specific surface area

Typical specific surface area:
ca. 673 m²/g
Range of specific surface area:
>= 609.4 - <= 674.6 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Range:
>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 1 - <= 100 nm
Percentile:
D50
Range:
>= 1 - <= 100 nm
Percentile:
D90
Range:
>= 1 - <= 100 nm
Range of length:
>= 1 - <= 100 nm
Range of lateral dimension 1:
>= 1 - <= 100 nm
Range of lateral dimension 2:
>= 1 - <= 100 nm
Range of aspect ratio (:1):
>= 1 - <= 1
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are spherical in nature.
Fraction of constituent particles in the size range 1-100 nm:
> 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
amorphous
Pure structure:
yes
Range:
> 99.7 - <= 100 %
Description:
X-Ray diffractograms of the manufactured mixture show no peaks relating to crystalline silicon dioxide.

Specific surface area

Range of specific surface area:
>= 4 - <= 800 m²/g
Range of volume specific surface area:
>= 8.8 - <= 2 200 m²/cm³
Skeletal density:
>= 1.7 - <= 2.25 g/cm³

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Typical composition:
ca. 99.7 %
Range:
>= 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Typical value:
ca. 15 nm
Range:
>= 0 - <= 20 nm
Percentile:
D50
Typical value:
ca. 23 nm
Range:
>= 0 - <= 60 nm
Percentile:
D90
Typical value:
ca. 46 nm
Range:
>= 30 - <= 60 nm
Typical length:
ca. 23 nm
Range of length:
>= 1 - <= 100 nm
Typical lateral dimension 1:
ca. 23 nm
Range of lateral dimension 1:
>= 1 - <= 100 nm
Typical lateral dimension 2:
ca. 23 nm
Range of lateral dimension 2:
>= 1 - <= 100 nm
Typical aspect ratio (:1):
ca. 1 :1
Range of aspect ratio (:1):
>= 1 - <= 1
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.

As shape is spheroidal, Typical lateral dimension 1, Typical lateral dimension 2 are equal to Typical Length . Typical Length is d50 value.
As shape is spheroidal, Typical aspect ration is 1 (the substance is not in fiber form).

Please see report 2020.075 - SID 17211. (ex batch number I044458101)
Fraction of constituent particles in the size range 1-100 nm:
> 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
amorphous
Pure structure:
yes
Typical composition:
> 99.7 %
Range:
> 99.7 - <= 100 %
Description:
X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

For concerned substance, please see reports HSL report_June 2018 / Laboratory number 1801858 LEVILITE Precipitated amorphous silica p3, 2020.075 - SID 17211 and ECETOC2006_2-3-1_xray.

Specific surface area

Typical specific surface area:
ca. 528 m²/g
Range of specific surface area:
>= 200 - <= 700 m²/g
Typical volume specific surface area:
ca. 1 104 m²/cm³
Range of volume specific surface area:
>= 400 - <= 1 500 m²/cm³
Skeletal density:
>= 1.7 - <= 2.25 g/cm³

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Range:
> 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D90
Range:
>= 12.7 - <= 31 nm
Percentile:
D50
Typical value:
ca. 9 nm
Range:
>= 3 - <= 29 nm
Percentile:
D10
Range:
>= 7.4 - <= 11 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Range:
>= 99.7 - <= 100 %

Specific surface area

Range of specific surface area:
>= 50 - <= 430 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: particulate/powder


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Remarks:
ND and Z1, primary particle shape: 100% spherical particles with regular shape.
Shape:
spherical
Pure shape:
yes
Typical composition:
ca. 100 %
Range:
ca. 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Remarks:
ND and Z1
Percentileopen allclose all
Percentile:
D10
Typical value:
>= 1.2 nm
Range:
>= 0.5 - <= 10 nm
Percentile:
D50
Typical value:
>= 2.9 nm
Range:
>= 2 - <= 14 nm
Percentile:
D90
Typical value:
>= 11 nm
Range:
>= 5 - <= 40 nm
Typical aspect ratio (:1):
ca. 1 :1
Additional information:
According to the TEM image and histogram, ND type Quartzene material’s particle dize varies between 1 to 20 nm where as the majority of the particles are below 10 nm in size.
As it can be seen from the TEM analysis, Z1 type Quartzene material’s particle size varies between 5 to 20 nm in the image and it should be mentioned that the analytical sample is an example of the Z1 particles on the TEM grid, different parts of the same gird may have different particles and the particle size can vary between 10 to 30 nm in size.
Fraction of constituent particles in the size range 1-100 nm:
>= 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
amorphous
Pure structure:
yes
Typical composition:
>= 99.7 %
Range:
>= 99.7 - <= 100 %
Crystal system:
not applicable
Description:
Z1 and ND is 100% amorphous (< 0,3 % crystalline parts). X-ray diffraction diagrams of ND/Z1 show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below. please see XRD-analysis for confirmation.

Specific surface area

Typical specific surface area:
>= 279 m²/g
Range of specific surface area:
>= 122 - <= 556 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
single nanoform

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Typical composition:
100 %
Range:
>= 95 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 1 - <= 100 nm
Percentile:
D25
Typical value:
ca. 5.8 nm
Range:
>= 4.1 - <= 7.5 nm
Percentile:
D50
Typical value:
ca. 6.8 nm
Range:
>= 4.3 - <= 9.3 nm
Percentile:
D75
Typical value:
ca. 8.1 nm
Range:
>= 5.2 - <= 11 nm
Percentile:
D90
Range:
>= 1 - <= 100 nm
Typical aspect ratio (:1):
< 3 :1
Fraction of constituent particles in the size range 1-100 nm:
>= 99 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Typical composition:
ca. 100 %
Range:
>= 99.7 - <= 100 %

Specific surface area

Typical specific surface area:
ca. 310 m²/g
Range of specific surface area:
>= 216.2 - <= 312.5 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: 3-dimensional branched fractal aggregates
Pure shape:
yes
Typical composition:
> 99 %
Range:
> 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 4 - <= 10 nm
Percentile:
D50
Range:
>= 10 - <= 20 nm
Percentile:
D90
Range:
> 12 - <= 30 nm
Range of length:
>= 1 - <= 100 nm
Range of lateral dimension 1:
>= 1 - <= 100 nm
Range of lateral dimension 2:
>= 1 - <= 100 nm
Typical aspect ratio (:1):
ca. 1 :1
Additional information:
The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
Fraction of constituent particles in the size range 1-100 nm:
> 95 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Name:
Amorphous
Pure structure:
yes
Range:
>= 99.7 - <= 100 %
Description:
X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

Specific surface area

Range of specific surface area:
>= 70 - <= 330 m²/g
Range of volume specific surface area:
>= 154 - <= 726 m²/cm³
Skeletal density:
ca. 2.2 g/cm³

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance


Constituent 1
Chemical structure
Reference substance name:
Aluminium oxide
EC Number:
215-691-6
EC Name:
Aluminium oxide
CAS Number:
1344-28-1
Molecular formula:
Al2O3
IUPAC Name:
Aluminium oxide
Constituent 2
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms
Cross-reference
Reason / purpose:
justification for reporting set of similar nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
spherical
Pure shape:
yes
Range:
> 99 - <= 100 %

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D90
Range:
>= 12.7 - <= 24 nm
Percentile:
D50
Range:
>= 9.4 - <= 16 nm
Percentile:
D10
Range:
>= 7.4 - <= 9 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 50 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Range:
>= 99.7 - <= 100 %

Specific surface area

Range of specific surface area:
>= 75 - <= 420 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Specific surface area

Range of specific surface area:
ca. 295 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Type:
legal entity composition of the substance
State Form:
solid: bulk


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide
Type:
legal entity composition of the substance
State Form:
solid: nanoform


Constituent 1
Chemical structure
Reference substance name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Characterisation of nanoforms

Type of information reported:
set of nanoforms

Shape

Shape description
Shape category:
spheroidal
Shape:
other: potato shape
Pure shape:
yes

Particle size distribution and range

Particle size distribution and range
Shape category:
spheroidal
Percentileopen allclose all
Percentile:
D10
Range:
>= 7 - <= 50 nm
Percentile:
D50
Range:
>= 9 - <= 67 nm
Percentile:
D90
Range:
>= 13 - <= 100 nm
Fraction of constituent particles in the size range 1-100 nm:
>= 99.9 - <= 100 %

Crystallinity

Structures
Structure:
amorphous
Pure structure:
yes
Crystal system:
not applicable

Specific surface area

Typical specific surface area:
ca. 200 m²/g
Range of specific surface area:
>= 79 - <= 523 m²/g

Surface functionalisation / treatment

Surface treatment applied:
no
Does the set contain both treated and non-surface treated nanoforms?:
no
Type:
boundary composition of the substance
State Form:
solid: nanoform


Constituent 1