Registration Dossier

Identification

Chemical structure
Display Name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
Silicon dioxide

Type of Substance

Composition:
mono-constituent substance
Origin:
inorganic

Substance Identifiers open all close all

  • EQ-Pak
  • Silica Gel
  • Sorb-it
  • White Gel
  • Compositions

    Boundary Composition(s) open all close all

    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Snythetic amorphous silicon dioxide, nanostructured material_Set1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no

    Legal Entity Composition(s) open all close all

    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of nanoform:
    WACKER Fumed SAS
    Name of set of nanoforms:
    Set 1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Range of length:
    >= 1 - <= 100 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of nanoform:
    WACKER Precipitated SAS
    Name of set of nanoforms:
    Set 1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Range of length:
    >= 1 - <= 100 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silica, amorphous, pyrogenic, crystalline-free
    CAS Number:
    112945-52-5
    Molecular formula:
    O2Si
    IUPAC Name:
    Silica, amorphous, pyrogenic, crystalline-free


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    Silicon dioxide

    Composition(s) generated upon use

    Other types of composition(s)