Registration Dossier

Identification

Chemical structure
Display Name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
dioxosilane

Type of Substance

Composition:
mono-constituent substance
Origin:
inorganic

Substance Identifiers open all close all

  • Silicon dioxide
  • Silicon dioxide (amorphous)
  • 231-545-4
  • 700-981-1
  • EC 700-981-1
  • 112926-00-8
  • 112926-00-8
  • 112945-52-5
  • 60676-86-0
  • 7631-86-9
  • Silica
  • Silica Gel
  • Silicagel
  • Synthetic amorphous silica
  • Synthetic amorphous silica (SAS)
  • precipitated silica
  • white carbon black
  • E551
  • ABSIL -100
  • ABSIL-HC
  • AC6120 carrier
  • AEROPERL
  • ARSIL
  • ART Hydroprocessing catalysts
  • ART Hydroprocessing catalysts
  • Acematt [Silica, precipitated]
  • Acematt [Silica, precipitated]
  • Admafine Silica
  • Adsorbosphere™
  • Aeroperl [Silica, fumed, pyrogenic]
  • Aerosil [Silica, fumed, pyrogenic]
  • Airlica
  • All-Guard™
  • Allsphere™
  • Alltech®
  • Alusilica
  • ApART™ System, ApART™ Catalyst System
  • Apollo™
  • BARIACE
  • BARIFINE
  • BECOSORB
  • Brava™
  • Britesorb
  • CAB-O-SIL® fumed silica
  • CAB-O-SIL™ Colloidal silica
  • CAB-O-SIL™ silica
  • CAB-O-SPERSE® silica dispersion
  • CATOKAY
  • CHIFFONSIL
  • CP
  • Cabot aerogel
  • Caldic Silica
  • Caldic Silica 02
  • Caldic Silica 02GR
  • Caldic Silica 04
  • Caldic Silica 04GR
  • Caldic Silica 05
  • Caldic Silica 05 MP
  • Caldic Silica 05GR
  • Caldic Silica 06
  • Caldic Silica 06GR
  • Caldic Silica 07
  • Caldic Silica 07GR
  • Caldic Silica 08MP
  • Caldic Silica 08T
  • Caldic Silica 09
  • Caldic Silica 09GR
  • Carplex [Silica, precipitated]
  • Catalyst KD CAT
  • Chameleon
  • Chameleon Gel
  • Compression Pack™
  • DARACLAR®
  • DAVISIL®
  • DURAFILL®
  • DX® Catalyst Platform, DX® Catalyst Technology
  • Denka Fused Silica (DF)
  • EBROSIL
  • EQ-Pak
  • EXP [Silica, precipitated]
  • Econosil™
  • Egesil [Silica, precipitated]
  • Enova® aerogel
  • Envirogel
  • Everest®
  • FLOWING AGENT TP88
  • Flo-Gard¿
  • Fumed Silica
  • GRADE
  • GR® catalysts, technology
  • Gas Chrom™
  • Gasil
  • Genesis®
  • Grace Davison®
  • GraceAlpha™
  • GracePure™
  • Grace®
  • HC
  • HOESCH BK
  • HOLLOWY-N15
  • HOP Catalyst
  • Hi-Sil¿
  • High Stability Low Sediment (HSLS), HSLS™ Catalyst Technology
  • IBERSIL
  • ICR Catalyst
  • Indicator Gel
  • Insil [Silica, precipitated]
  • JR-800
  • Jones Chromatography™
  • KONASIL
  • Kovasil
  • Köstropur®
  • Köstrosolid®
  • Köstrosol®
  • Köstrosorb®
  • LC FINING technology, LC FINING™ Catalyst
  • LEVILITE
  • LS™ Catalyst Platform, LS™ Catalyst Technology
  • LUDOX®
  • Lo-Vel¿
  • Lucilite
  • Lumira® aerogel
  • MATREX®
  • MEBU™ Pilot Plant, Mini Ebullating Bed Unit (MEBU)
  • MFIL- 150(G)
  • MFIL- 200(S)
  • MFIL-125
  • MFIL-125(S)
  • MFIL-P (S)
  • MFIL-P(U)
  • MICROD
  • MIZUKASIL P-73
  • MODcol®
  • MT-500SA
  • Microsil
  • N-IDS carrier
  • Neosil
  • Neosyl
  • NiSAT carrier
  • No specific trade names available: synthetic amorphous silica imported through Ziegler Natta Catalyst preparation, the recipes and trade names of which are company confidential, as they are tailor made for the specific customer.
  • OCR® Catalysts
  • Orange Gel
  • PE
  • PERKASIL®
  • PHOENIX™ catalyst, PHOENIX Process
  • Precipitated silica
  • Prep-Guard™
  • Prevail™
  • ProZap™
  • QUARTRON PL
  • REMASOL®
  • ReforMax carrier
  • Reolosil
  • Rescor castable ceramic binders, Resbond adhesive, Thermeez Ceramic Putty
  • Rocket™
  • Rubingel
  • SATINIER
  • SHIELDEX®
  • SILICA A
  • SILICA GEL
  • SILICA GEL CARRIER SG
  • SILICA GEL CAT LITTER
  • SILICA LC
  • SILICA MICRO BEAD
  • SILICA PERAL
  • SILICA VP
  • SILICON DIOXIDE
  • SILIGEL
  • SIOGEL® white
  • SMELLAWAY
  • SP
  • SPHERICA
  • SPHERON L-1500
  • SS-SIL
  • SSP
  • STR
  • SYLOBEAD®
  • SYLOBLANC™
  • SYLOBLOC®
  • SYLODENT®
  • SYLOID®
  • SYLOJET®
  • SYLOX®
  • San-Sil¿
  • Several Catalyst grades including synthetic amorphous silica, e.g. SYLOPOL®, P.O. CAT CARRIER XPO, Ziegler Natta Catalyst grades
  • SiO2
  • SiO2-Sootstaub
  • Sident [Silica, precipitated]
  • Sident [Silica, precipitated]
  • Silcron
  • Silene¿
  • Silfil
  • Silica
  • Silica Gel
  • Silicagel
  • Silicon Dioxide
  • Silicon dioxide (SD-B)
  • Silicon dioxide as used in different catalyst mixtures
  • Silicon dioxide in different catalyst mixtures
  • Silizium Dioxid
  • Siliziumdioxid
  • Sipernat [Silica, precipitated]
  • Sipernat [Silica, precipitated]
  • SmART Catalyst System® series, SmART System
  • Sodium dihydrogenorthophosphate
  • Sorb-it
  • Sorbosil
  • Sorbsil
  • StART™ System, StART™ Catalyst System
  • T-Lite
  • TAFOSIL
  • TAVERSIL
  • TIXOSIL
  • TP88
  • TREADSIL
  • TRISYL®
  • TYSIL
  • Thermal Wrap™
  • Tokusil
  • Tolled trading goods
  • ULS
  • ULTRABOND™ fumed silica
  • Ultra-Clean™
  • Ultrasil [Silica, precipitated]
  • Ultrasil [Silica, precipitated]
  • Uni-Fit™
  • VisionHT™
  • Vydac®
  • WL [Silica, precipitated]
  • Wet Gel
  • Wetgel
  • White Carbon HCSIL
  • White Gel
  • XWP GEL
  • YH [Silica, precipitated]
  • ZEODENT®
  • ZEOFLO®
  • ZEOFOAM®
  • ZEOFREE®
  • ZEOPOL®
  • ZEOSIL
  • ZEOSYL®
  • ZEOTHIX®
  • ZEO®
  • ZS
  • Zeobead
  • Zeoprep
  • Zeosphere
  • carbon-white
  • fumed silica
  • insert your own names, for example "Aerosil"
  • silica gel
  • silicon dioxide
  • white carbon black
  • I0250
    (No other type specified)
    The silica substance that we are registering is pyrogenic
    (No other type specified)

    Compositions

    Boundary Composition(s) open all close all

    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Snythetic amorphous silicon dioxide, nanostructured material_Set1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silica, spheroidal nanostructured material
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Range of length:
    >= 1 - <= 100 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide (SAS), nanomaterial

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Fraction of constituent particles in the size range 1-100 nm:
    100 - 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide (SAS), nanomaterial, silanized

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Fraction of constituent particles in the size range 1-100 nm:
    100 - 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    Surface treatments
    Surface treatment name:
    Silanized SAS
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
    Percentage of coverage of particle surface, %:
    > 0 - < 50
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide, nanostructured material, silanized
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    Surface treatments
    Surface treatment name:
    SAS Silanized
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
    Percentage of coverage of particle surface, %:
    >= 30 - < 100
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Range of length:
    >= 1 - <= 100 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    Surface treatments
    Surface treatment name:
    SAS Silanized
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
    Percentage of coverage of particle surface, %:
    >= 30 - < 100
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Range of length:
    >= 1 - <= 100 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Range of length:
    >= 1 - <= 100 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: bulk


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Legal Entity Composition(s) open all close all

    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material_Set 1

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 2 - <= 25 nm
    Percentile:
    D50
    Range:
    >= 2.56 - <= 50 nm
    Percentile:
    D90
    Range:
    >= 3.5 - <= 70 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 50 - <= 400 m²/g
    Range of volume specific surface area:
    >= 110 - <= 880 m²/cm³
    Skeletal density:
    ca. 2.2 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material_Set 1

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 2 - <= 25 nm
    Percentile:
    D50
    Range:
    >= 2.5 - <= 50 nm
    Percentile:
    D90
    Range:
    >= 3.5 - <= 70 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 800 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 1 760 m²/cm³
    Skeletal density:
    ca. 2.2 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 3.5 - <= 13 nm
    Percentile:
    D50
    Range:
    >= 5 - <= 16 nm
    Percentile:
    D90
    Range:
    >= 7 - <= 19 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 800 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 1 760 m²/cm³
    Skeletal density:
    ca. 2.2 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    > 99 - < 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    > 10 - < 40 nm
    Percentile:
    D50
    Range:
    > 15 - < 60 nm
    Percentile:
    D90
    Range:
    > 20 - < 80 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent part cles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - < 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99 - <= 100 %

    Specific surface area

    Range of specific surface area:
    > 600 - < 800 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform
    Name of nanoform:
    Orisil 200 - hydrophilic fumed silica with surface area approximately 200

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    100 %
    Range:
    >= 100 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Typical value:
    7.7 nm
    Range:
    >= 2.7 - <= 12.7 nm
    Percentile:
    D50
    Typical value:
    12.6 nm
    Range:
    >= 7.6 - <= 17.6 nm
    Percentile:
    D90
    Typical value:
    20.2 nm
    Range:
    >= 15.2 - <= 25.2 nm
    Fraction of constituent particles in the size range 1-100 nm:
    >= 100 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes

    Specific surface area

    Typical specific surface area:
    228 m²/g
    Range of specific surface area:
    >= 226 - <= 230 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform
    Name of nanoform:
    Orisil M130 - hydrophobic fumed silica with surface area after treatment process - approximately 130

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    100 %
    Range:
    >= 100 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Typical value:
    11.4 nm
    Range:
    >= 2.4 - <= 20.4 nm
    Percentile:
    D50
    Typical value:
    18.2 nm
    Range:
    >= 9.2 - <= 27.2 nm
    Percentile:
    D90
    Typical value:
    31.9 nm
    Range:
    >= 22.9 - <= 30.9 nm
    Fraction of constituent particles in the size range 1-100 nm:
    >= 100 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes

    Specific surface area

    Typical specific surface area:
    124 m²/g
    Range of specific surface area:
    >= 122 - <= 126 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform
    Name of nanoform:
    Orisil SF125 - hydrophobic fumed silica with surface area after treatment process - approximately 125

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    100 %
    Range:
    >= 100 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Typical value:
    9.7 nm
    Range:
    >= 3.7 - <= 15.7 nm
    Percentile:
    D50
    Typical value:
    15 nm
    Range:
    >= 9 - <= 21 nm
    Percentile:
    D90
    Typical value:
    23.2 nm
    Range:
    >= 17.2 - <= 29.2 nm
    Fraction of constituent particles in the size range 1-100 nm:
    >= 100 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes

    Specific surface area

    Typical specific surface area:
    140 m²/g
    Range of specific surface area:
    >= 138 - <= 142 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform
    Name of nanoform:
    Synthetic amorphous silica, spheroidal nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Skeletal density:
    ca. 1.9 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Range of length:
    >= 1 - <= 100 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 800 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Surface treatments
    Surface treatment name:
    hydrophilic
    State Form:
    solid: bulk


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of nanoform:
    WACKER Fumed SAS
    Name of set of nanoforms:
    Set 1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Range of length:
    >= 1 - <= 100 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of nanoform:
    WACKER Precipitated SAS
    Name of set of nanoforms:
    Set 1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Range of length:
    >= 1 - <= 100 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide (SAS), nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    100 - 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The limit of quantifcation is 0.3 % corresponding to a limit of detection of 0.1 % quartz. The maximum quartz content is less than 0.1%.

    Specific surface area

    Range of specific surface area:
    >= 10 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 6.8 - <= 2 250 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide (SAS), nanostructured material, silanized

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    100 - 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 10 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 6.8 - <= 2 250 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    WACKER Silanized SAS
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    Surface treatmentsopen allclose all
    Surface treatment name:
    SAS Silanized
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
    Percentage of coverage of particle surface, %:
    >= 30 - < 100
    Surface treatment name:
    CAS 75-78-5
    Surface treatmentopen allclose all
    External layer:
    hydrophobic
    Description:
    Reaction of SAS with dichloro(dimethyl)silane, CAS 75-78-5. Typical carbon content below 10%.
    Examples H15 grade 0.8-1.2 % C; H18 grade 4.0-5.2 % C (highest carbon content).
    Percentage of coverage of particle surface, %:
    >= 30 - < 100
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    WACKER Precipitated SAS
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    WACKER Fumed SAS
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 8 - <= 90 nm
    Percentile:
    D50
    Range:
    >= 5 - <= 50 nm
    Percentile:
    D10
    Range:
    >= 2 - <= 30 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 99 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    SAS, nanostructured material
    Pure structure:
    yes
    Range:
    >= 99.9 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. T
    he detection limit for crystallinity by X-ray is below the maximum order of 0.3% by weight.

    Specific surface area

    Range of specific surface area:
    >= 80 - <= 800 m²/g
    Range of volume specific surface area:
    >= 200 - <= 1 500 m²/cm³
    Skeletal density:
    ca. 2.24 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material, ST
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 8 - <= 90 nm
    Percentile:
    D50
    Range:
    >= 5 - <= 50 nm
    Percentile:
    D10
    Range:
    >= 2 - <= 30 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 99 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    SAS, nanostructured material, ST
    Pure structure:
    yes
    Range:
    >= 99.9 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. T
    he detection limit for crystallinity by X-ray is below the maximum order of 0.3% by weight.

    Specific surface area

    Range of specific surface area:
    >= 80 - <= 800 m²/g
    Range of volume specific surface area:
    >= 200 - <= 1 500 m²/cm³
    Skeletal density:
    ca. 2.24 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    Surface treatmentsopen allclose all
    Surface treatment name:
    SAS, nanostructured material, ST
    sythetically-spherical-other/phenyl 1
    Surface treatmentopen allclose all
    External layer:
    hydrophobic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes hydrophilic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups: Phenyl
    Percentage of coverage of particle surface, %:
    >= 90 - <= 100
    Surface treatment name:
    SAS, nanostructured material, ST
    sythetically-spherical-methacryl 1
    Surface treatment
    Order:
    #1
    External layer:
    hydrophilic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes hydrophilic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Methacryl
    Percentage of coverage of particle surface, %:
    >= 90 - <= 100
    Surface treatment name:
    SAS, nanostructured material, ST
    sythetically-spherical-amino 1
    Surface treatment
    Order:
    #1
    External layer:
    hydrophilic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes hydrophilic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Amino
    Percentage of coverage of particle surface, %:
    >= 90 - <= 100
    Surface treatment name:
    SAS, nanostructured material, ST
    sythetically-spherical-alkyl 1
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes hydrophobic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl
    Percentage of coverage of particle surface, %:
    >= 90 - <= 100
    Surface treatment name:
    SAS, nanostructured material, ST
    waterglass-spherical-alkyl 1b
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes hydrophobic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl
    Percentage of coverage of particle surface, %:
    >= 90 - <= 100
    Surface treatment name:
    SAS, nanostructured material, ST
    waterglass-spherical-alkyl 1a
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes hydrophobic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl
    Percentage of coverage of particle surface, %:
    >= 90 - <= 100
    Surface treatment name:
    SAS, nanostructured material, ST
    waterglass-irregular-amino 1
    Surface treatment
    Order:
    #1
    External layer:
    hydrophilic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes hydrophilic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Amino
    Percentage of coverage of particle surface, %:
    >= 90 - <= 100
    Surface treatment name:
    SAS, nanostructured material, ST
    waterglass-irregular-alkyl 1b
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes hydrophobic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl
    Percentage of coverage of particle surface, %:
    >= 90 - <= 100
    Surface treatment name:
    SAS, nanostructured material, ST
    waterglass-irregular-alkyl 1a
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes hydrophobic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Alkyl
    Percentage of coverage of particle surface, %:
    >= 90 - <= 100
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured colloidal material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 10 - <= 90 nm
    Percentile:
    D50
    Range:
    >= 8 - <= 60 nm
    Percentile:
    D10
    Range:
    >= 5 - <= 40 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 99 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    Colloidal silica
    Pure structure:
    yes
    Range:
    >= 99.9 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. T
    he detection limit for crystallinity by X-ray is below the maximum order of 0.3% by weight.

    Specific surface area

    Range of specific surface area:
    >= 30 - <= 200 m²/g
    Range of volume specific surface area:
    >= 80 - <= 600 m²/cm³
    Skeletal density:
    ca. 2.48 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured colloidal material, ST

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 10 - <= 90 nm
    Percentile:
    D50
    Range:
    >= 8 - <= 60 nm
    Percentile:
    D10
    Range:
    >= 5 - <= 40 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 99 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    Colloidal silica
    Pure structure:
    yes
    Range:
    >= 99.9 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. T
    he detection limit for crystallinity by X-ray is below the maximum order of 0.3% by weight.

    Specific surface area

    Range of specific surface area:
    >= 30 - <= 200 m²/g
    Range of volume specific surface area:
    >= 80 - <= 600 m²/cm³
    Skeletal density:
    ca. 2.48 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    Surface treatments
    Surface treatment name:
    Klebosol, ST Alox
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    DESCRIBE THE PROCESS BEHIND THE SURFACE FUNCTIONALISATION / TREATMENT:
    - Main features of the surface treatment/functionalisation process: product becomes cationic
    - the type of process/reaction (hydrolysis, oxygen treatment, acid washing, etc.): Hydrolysis
    - any purification step: no
    - Functionalities introduced by the treatment (e.g. carboxyl, amino, hydroxyl groups): Al2O3
    Percentage of coverage of particle surface, %:
    > 90 - < 100
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform
    Name of nanoform:
    amorphous_SiO2_untreated

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Remarks:
    aggregates and agglomerates of primary nano particles
    Percentileopen allclose all
    Percentile:
    D90
    Typical value:
    ca. 13.3 μm
    Range:
    > 10 - < 15 μm
    Percentile:
    D50
    Typical value:
    ca. 8.23 μm
    Range:
    > 6 - < 10 μm
    Percentile:
    D10
    Typical value:
    ca. 5.13 μm
    Range:
    > 3 - < 6 μm
    Additional information:
    nanostructured material consisting of aggregates and agglomerates which are composed of fused primary particles. Even after ultrasonic treatment, aggregates were the constituent particle. There was no physical boundary between the fine features within aggregates. The aggregates were consisted with primary particles around 20nm (average aspect ratio 1.18). Free “primary particles” were not observed.
    Fraction of constituent particles in the size range 1-100 nm:
    ca. 0 - 0 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous silicon dioxide
    Pure structure:
    yes
    Typical composition:
    < 99.7 %
    Description:
    A crystalline structure of Silicon dioxide was not detected in the sample. The amount of crystalline Silicon dioxides was less than 0.3%.

    Specific surface area

    Typical specific surface area:
    ca. 160.7 m²/g
    Range of specific surface area:
    > 159 - < 160.7 m²/g
    Skeletal density:
    > 2.18 - < 2.19 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform
    Name of nanoform:
    Speroidal

    Shape

    Shape description
    Shape category:
    spheroidal
    Remarks:
    ND and Z1, primary particle shape: 100% spherical particles with regular shape.
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    ca. 100 %
    Range:
    ca. 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Remarks:
    ND and Z1
    Percentileopen allclose all
    Percentile:
    D10
    Typical value:
    >= 1.2 nm
    Range:
    >= 0.5 - <= 10 nm
    Percentile:
    D50
    Typical value:
    >= 2.9 nm
    Range:
    >= 2 - <= 14 nm
    Percentile:
    D90
    Typical value:
    >= 11 nm
    Range:
    >= 5 - <= 40 nm
    Additional information:
    According to the TEM image and histogram, ND type Quartzene material’s particle dize varies between 1 to 20 nm where as the majority of the particles are below 10 nm in size.
    As it can be seen from the TEM analysis, Z1 type Quartzene material’s particle size varies between 5 to 20 nm in the image and it should be mentioned that the analytical sample is an example of the Z1 particles on the TEM grid, different parts of the same gird may have different particles and the particle size can vary between 10 to 30 nm in size.
    Fraction of constituent particles in the size range 1-100 nm:
    >= 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Typical composition:
    >= 99.7 %
    Range:
    >= 99.7 - <= 100 %
    Crystal system:
    not applicable
    Description:
    Z1 and ND is 100% amorphous (< 0,3 % crystalline parts). X-ray diffraction diagrams of ND/Z1 show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below. please see XRD-analysis for confirmation.

    Specific surface area

    Typical specific surface area:
    >= 279 m²/g
    Range of specific surface area:
    >= 122 - <= 556 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform
    Name of nanoform:
    Speroidal

    Shape

    Shape description
    Shape category:
    spheroidal
    Remarks:
    Z1 Primary particle shape: 100% spherical particles with regular shape
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    ca. 100 %
    Range:
    ca. 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Remarks:
    Z1
    Percentileopen allclose all
    Percentile:
    D10
    Typical value:
    ca. 7.1 nm
    Range:
    >= 5 - <= 10 nm
    Percentile:
    D50
    Typical value:
    ca. 10.8 nm
    Range:
    >= 8 - <= 14 nm
    Percentile:
    D90
    Typical value:
    ca. 23 nm
    Range:
    >= 12 - <= 40 nm
    Additional information:
    According to the TEM image and histogram, ND type Quartzene material’s particle dize varies between 1 to 20 nm where as the majority of the particles are below 10 nm in size.
    As it can be seen from the TEM analysis, Z1 type Quartzene material’s particle size varies between 5 to 20 nm in the image and it should be mentioned that the analytical sample is an example of the Z1 particles on the TEM grid, different parts of the same gird may have different particles and the particle size can vary between 10 to 30 nm in size.
    Fraction of constituent particles in the size range 1-100 nm:
    >= 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Typical composition:
    >= 99.7 %
    Range:
    >= 99.7 - <= 100 %
    Description:
    Z1 and ND is 100% amorphous (< 0,3 % crystalline parts). X-ray diffraction diagrams of ND/Z1 show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below. please see XRD-analysis for confirmation.

    Specific surface area

    Typical specific surface area:
    >= 390 m²/g
    Range of specific surface area:
    >= 122 - <= 556 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Surface treatments
    Surface treatment name:
    Hydrophobization of silica whit Hexamethyldisilazane
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    Hydrophobization of silica whit Hexamethyldisilazane
    Percentage of coverage of particle surface, %:
    >= 30 - <= 100
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    > 5 - < 20 nm
    Percentile:
    D50
    Range:
    > 10 - < 30 nm
    Percentile:
    D90
    Range:
    > 15 - < 40 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - < 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99 - <= 100 %

    Specific surface area

    Range of specific surface area:
    > 500 - < 700 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silica, nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    > 4 - < 10 nm
    Percentile:
    D50
    Range:
    > 6 - < 20 nm
    Percentile:
    D90
    Range:
    10 - < 50 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99 - <= 100 %

    Specific surface area

    Range of specific surface area:
    > 250 - < 370 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    > 5 - < 15 nm
    Percentile:
    D50
    Range:
    > 7 - < 25 nm
    Percentile:
    D90
    Range:
    > 10 - < 35 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99 - <= 100 %

    Specific surface area

    Range of specific surface area:
    > 310 - < 410 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    > 5 - < 15 nm
    Percentile:
    D50
    Range:
    > 7 - < 30 nm
    Percentile:
    D90
    Range:
    > 10 - < 40 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %

    Specific surface area

    Range of specific surface area:
    > 120 - < 250 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide, nanostructured material, silanized

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    > 98 - < 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    > 2 - < 15 nm
    Percentile:
    D50
    Range:
    > 4 - < 30 nm
    Percentile:
    D90
    Range:
    > 10 - < 45 nm
    Additional information:
    Synthetic amorphous silica exists as a nanostructured material consisting of aggregates and agglomerates which are composed of primary particles; the particle size from the DLS results is larger than the primary particles size.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - < 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 98 - < 100 %

    Specific surface area

    Range of specific surface area:
    > 50 - < 500 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    > 2 - < 15 nm
    Percentile:
    D50
    Range:
    > 4 - < 35 nm
    Percentile:
    D90
    Range:
    > 8 - < 45 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - < 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99 - <= 100 %

    Specific surface area

    Range of specific surface area:
    > 50 - < 500 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: bulk


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide, nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 95 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    > 5 - < 20 nm
    Percentile:
    D50
    Range:
    > 10 - < 35 nm
    Percentile:
    D90
    Range:
    > 13 - < 80 nm
    Additional information:
    The result of DLS is only used as an auxiliary reference and does not represent the true primary particle size. The data D10,D50 and D90 is base on the result of TEM and DLS.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 90 - < 100 %

    Specific surface area

    Range of specific surface area:
    > 140 - < 200 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silica, nanostructured material

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    > 99 - < 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    > 15 - < 60 nm
    Percentile:
    D50
    Range:
    > 10 - < 30 nm
    Percentile:
    D10
    Range:
    > 8 - < 20 nm
    Additional information:
    The D10, D50 and D90 data is based on the result of TEM and DLS.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - < 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99 - < 100 %

    Specific surface area

    Range of specific surface area:
    > 120 - < 210 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    100 %
    Range:
    >= 95 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D25
    Typical value:
    ca. 5.8 nm
    Range:
    >= 4.1 - <= 7.5 nm
    Percentile:
    D50
    Typical value:
    ca. 6.8 nm
    Range:
    >= 4.3 - <= 9.3 nm
    Percentile:
    D75
    Typical value:
    ca. 8.1 nm
    Range:
    >= 5.2 - <= 11 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Typical aspect ratio (:1):
    < 3 :1
    Fraction of constituent particles in the size range 1-100 nm:
    >= 99 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Typical composition:
    ca. 100 %
    Range:
    >= 99.7 - <= 100 %

    Specific surface area

    Typical specific surface area:
    ca. 310 m²/g
    Range of specific surface area:
    >= 216.2 - <= 312.5 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    100 %
    Range:
    >= 95 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    > 1 - < 100 nm
    Percentile:
    D25
    Typical value:
    ca. 7.2 nm
    Range:
    >= 5.5 - <= 9.5 nm
    Percentile:
    D50
    Typical value:
    ca. 8.4 nm
    Range:
    >= 5.8 - <= 11.9 nm
    Percentile:
    D75
    Typical value:
    ca. 9.9 nm
    Range:
    >= 7 - <= 14.1 nm
    Percentile:
    D90
    Range:
    > 1 - <= 100 nm
    Typical aspect ratio (:1):
    < 3 :1
    Fraction of constituent particles in the size range 1-100 nm:
    >= 99 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Typical composition:
    ca. 100 %
    Range:
    >= 99.7 - <= 100 %

    Specific surface area

    Typical specific surface area:
    ca. 297 m²/g
    Range of specific surface area:
    >= 280.8 - <= 299.2 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    100 %
    Range:
    >= 95 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D25
    Typical value:
    ca. 3.5 nm
    Range:
    >= 1.9 - <= 5.3 nm
    Percentile:
    D50
    Typical value:
    ca. 4.3 nm
    Range:
    >= 1.8 - <= 7.3 nm
    Percentile:
    D75
    Typical value:
    ca. 5.2 nm
    Range:
    >= 2.3 - <= 8.9 nm
    Percentile:
    D90
    Range:
    >= 1 - < 100 nm
    Typical aspect ratio (:1):
    < 3 :1
    Fraction of constituent particles in the size range 1-100 nm:
    >= 99 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Typical composition:
    ca. 100 %
    Range:
    >= 99.7 - <= 100 %

    Specific surface area

    Typical specific surface area:
    ca. 673 m²/g
    Range of specific surface area:
    >= 609.4 - <= 674.6 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    100 %
    Range:
    >= 95 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    1 - < 100 nm
    Percentile:
    D25
    Typical value:
    ca. 5.2 nm
    Range:
    >= 3.6 - <= 6.8 nm
    Percentile:
    D50
    Typical value:
    ca. 6.9 nm
    Range:
    >= 4.4 - <= 9.4 nm
    Percentile:
    D75
    Typical value:
    ca. 8.4 nm
    Range:
    >= 5.5 - <= 11.3 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Typical aspect ratio (:1):
    < 3 :1
    Fraction of constituent particles in the size range 1-100 nm:
    >= 99 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Typical composition:
    ca. 100 %
    Range:
    >= 99.7 - <= 100 %

    Specific surface area

    Typical specific surface area:
    ca. 964 m²/g
    Range of specific surface area:
    >= 960.9 - <= 967.1 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    100 %
    Range:
    >= 95 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - < 100 nm
    Percentile:
    D25
    Typical value:
    ca. 4.5 nm
    Range:
    >= 2.9 - <= 6.1 nm
    Percentile:
    D50
    Typical value:
    ca. 5.5 nm
    Range:
    >= 3 - <= 8 nm
    Percentile:
    D75
    Typical value:
    ca. 6.5 nm
    Range:
    >= 3.6 - <= 9.4 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Typical aspect ratio (:1):
    < 3 :1
    Fraction of constituent particles in the size range 1-100 nm:
    >= 99 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Typical composition:
    ca. 100 %
    Range:
    >= 99.7 - <= 100 %

    Specific surface area

    Typical specific surface area:
    ca. 601 m²/g
    Range of specific surface area:
    >= 597.8 - <= 604.2 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: bulk


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: bulk


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silica, amorphous, pyrogenic, crystalline-free
    CAS Number:
    112945-52-5
    Molecular formula:
    O2Si
    IUPAC Name:
    Silica, amorphous, pyrogenic, crystalline-free
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Typical composition:
    ca. 99.7 %
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Typical value:
    ca. 15 nm
    Range:
    >= 0 - <= 20 nm
    Percentile:
    D50
    Typical value:
    ca. 23 nm
    Range:
    >= 0 - <= 60 nm
    Percentile:
    D90
    Typical value:
    ca. 46 nm
    Range:
    >= 30 - <= 60 nm
    Typical length:
    ca. 23 nm
    Range of length:
    >= 1 - <= 100 nm
    Typical lateral dimension 1:
    ca. 23 nm
    Range of lateral dimension 1:
    >= 1 - <= 100 nm
    Typical lateral dimension 2:
    ca. 23 nm
    Range of lateral dimension 2:
    >= 1 - <= 100 nm
    Typical aspect ratio (:1):
    ca. 1 :1
    Range of aspect ratio (:1):
    >= 1 - <= 1
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.

    As shape is spheroidal, Typical lateral dimension 1, Typical lateral dimension 2 are equal to Typical Length . Typical Length is d50 value.
    As shape is spheroidal, Typical aspect ration is 1 (the substance is not in fiber form).

    Please see report 2020.075 - SID 17211. (ex batch number I044458101)
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Typical composition:
    > 99.7 %
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    For concerned substance, please see reports HSL report_June 2018 / Laboratory number 1801858 LEVILITE Precipitated amorphous silica p3, 2020.075 - SID 17211 and ECETOC2006_2-3-1_xray.

    Specific surface area

    Typical specific surface area:
    ca. 528 m²/g
    Range of specific surface area:
    >= 200 - <= 700 m²/g
    Typical volume specific surface area:
    ca. 1 104 m²/cm³
    Range of volume specific surface area:
    >= 400 - <= 1 500 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: bulk


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    spherical
    Pure shape:
    yes
    Typical composition:
    >= 99 %
    Range:
    >= 95 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Typical value:
    73 nm
    Range:
    >= 69 - <= 76 nm
    Percentile:
    D10
    Typical value:
    34 nm
    Range:
    >= 29 - <= 39 nm
    Percentile:
    D50
    Typical value:
    55 nm
    Range:
    >= 47 - <= 59 nm
    Fraction of constituent particles in the size range 1-100 nm:
    >= 99.9 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    silica
    Pure structure:
    yes
    Typical composition:
    >= 99 %
    Range:
    >= 95 - <= 100 %
    Crystal system:
    not applicable

    Specific surface area

    Typical specific surface area:
    143.8 m²/g
    Range of specific surface area:
    >= 136.5 - <= 152.4 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: bulk


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: particulate/powder


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    single nanoform

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Typical composition:
    100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Typical value:
    12.7 nm
    Range:
    >= 1 - <= 15 nm
    Percentile:
    D50
    Typical value:
    16.5 nm
    Range:
    >= 13 - <= 18 nm
    Percentile:
    D90
    Typical value:
    20.1
    Range:
    >= 17 - <= 25 nm
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Typical composition:
    > 99.7 %
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Typical specific surface area:
    141.68 m²/g
    Range of specific surface area:
    >= 100 - <= 200 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 5 - <= 67.6 nm
    Percentile:
    D50
    Range:
    >= 5 - <= 40 nm
    Percentile:
    D10
    Range:
    >= 1 - <= 27.8 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystal linity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 10.2 - <= 103.7 nm
    Percentile:
    D10
    Range:
    >= 5.8 - <= 45.2 nm
    Percentile:
    D50
    Range:
    >= 8 - <= 69 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Typical value:
    ca. 55 nm
    Range:
    >= 45 - <= 80 nm
    Percentile:
    D50
    Typical value:
    ca. 100 nm
    Range:
    >= 80 - <= 150 nm
    Percentile:
    D90
    Typical value:
    ca. 260 nm
    Range:
    >= 190 - <= 330 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    >= 82 - <= 98 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    synthetic amorphous silica
    Pure structure:
    yes

    Specific surface area

    Typical specific surface area:
    ca. 160 m²/g
    Range of specific surface area:
    >= 85 - <= 235 m²/g
    Typical volume specific surface area:
    342 m²/cm³
    Range of volume specific surface area:
    >= 182 - <= 503 m²/cm³
    Skeletal density:
    ca. 2.14 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1