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Diss Factsheets

Identification

Chemical structure
Display Name:
Silicon dioxide
EC Number:
231-545-4
EC Name:
Silicon dioxide
CAS Number:
7631-86-9
Molecular formula:
O2Si
IUPAC Name:
dioxosilane

Type of Substance

Composition:
mono-constituent substance
Origin:
inorganic

Substance Identifiers open all close all

  • Silicon dioxide
  • Silicon dioxide (amorphous)
  • 231-545-4
  • 700-981-1
  • EC 700-981-1
  • 112926-00-8
  • 112926-00-8
  • 112945-52-5
  • 60676-86-0
  • 71889-02-6
  • 7631-86-9
  • Silica
  • Silica Gel
  • Silicagel
  • Synthetic amorphous silica
  • Synthetic amorphous silica (SAS)
  • precipitated silica
  • white carbon black
  • E551
  • ABSIL -100
  • ABSIL-HC
  • AC6120 carrier
  • AEROPERL
  • AEROSIL [Silica, fumed, pyrogenic]
  • ARSIL
  • ART Hydroprocessing catalysts
  • ART Hydroprocessing catalysts
  • Acematt [Silica, precipitated]
  • Acematt [Silica, precipitated]
  • Admafine Silica
  • Aeroperl [Silica, fumed, pyrogenic]
  • Aerosil [Silica, fumed, pyrogenic]
  • Airlica
  • Alusilica
  • ApART™ System, ApART™ Catalyst System
  • BARIACE
  • BARIFINE
  • BECOSORB
  • Britesorb
  • CAB-O-SIL® fumed silica
  • CAB-O-SIL™ Colloidal silica
  • CAB-O-SIL™ silica
  • CAB-O-SPERSE® silica dispersion
  • CHIFFONSIL
  • CP
  • Cabot aerogel
  • Caldic Silica
  • Caldic Silica 02
  • Caldic Silica 02GR
  • Caldic Silica 04
  • Caldic Silica 04GR
  • Caldic Silica 05
  • Caldic Silica 05 MP
  • Caldic Silica 05GR
  • Caldic Silica 06
  • Caldic Silica 06GR
  • Caldic Silica 07
  • Caldic Silica 07GR
  • Caldic Silica 08MP
  • Caldic Silica 08T
  • Caldic Silica 09
  • Caldic Silica 09GR
  • Carplex [Silica, precipitated]
  • Catalyst KD CAT
  • Chameleon Gel
  • Compression Pack™
  • DARACLAR®
  • DAVISIL®
  • DX® Catalyst Platform, DX® Catalyst Technology
  • Denka Fused Silica (DF)
  • EBROSIL
  • EQ-Pak
  • EXP [Silica, precipitated]
  • Egesil [Silica, precipitated]
  • Enova® aerogel
  • Envirogel
  • FLOWING AGENT TP88
  • Fumed Silica
  • GRADE
  • GR® catalysts, technology
  • Gasil
  • HOLLOWY-N15
  • HOP Catalyst
  • High Stability Low Sediment (HSLS), HSLS™ Catalyst Technology
  • IBERSIL
  • ICR Catalyst
  • Indicator Gel
  • Insil [Silica, precipitated]
  • JR-800
  • KONASIL
  • Kovasil
  • Köstropur®
  • Köstrosolid®
  • Köstrosol®
  • Köstrosorb®
  • LC FINING technology, LC FINING™ Catalyst
  • LEVILITE
  • LS™ Catalyst Platform, LS™ Catalyst Technology
  • LUDOX®
  • Lucilite
  • Lumira® aerogel
  • MATREX®
  • MEBU™ Pilot Plant, Mini Ebullating Bed Unit (MEBU)
  • MFIL- 150(G)
  • MFIL- 200(S)
  • MFIL-125
  • MFIL-125(S)
  • MFIL-P (S)
  • MFIL-P(U)
  • MICROD
  • MIZUKASIL P-73
  • MT-500SA
  • Microsil
  • N-IDS carrier
  • Neosil
  • Neosyl
  • NiSAT carrier
  • No specific trade names available: synthetic amorphous silica imported through Ziegler Natta Catalyst preparation, the recipes and trade names of which are company confidential, as they are tailor made for the specific customer.
  • OCR® Catalysts
  • Orange Gel
  • PE
  • PHOENIX™ catalyst, PHOENIX Process
  • Precipitated silica
  • QUARTRON PL
  • REMASOL®
  • ReforMax carrier
  • Reolosil
  • Rescor castable ceramic binders, Resbond adhesive, Thermeez Ceramic Putty
  • Rubingel
  • SATINIER
  • SHIELDEX®
  • SILICA A
  • SILICA GEL
  • SILICA GEL CARRIER SG
  • SILICA GEL CAT LITTER
  • SILICA LC
  • SILICA MICRO BEAD
  • SILICA PERAL
  • SILICON DIOXIDE
  • SILIGEL
  • SIOGEL® white
  • SP
  • SPHERICA
  • SPHERON L-1500
  • SS-SIL
  • SSP
  • STR
  • SYLOBEAD®
  • SYLOBLANC™
  • SYLOBLOC®
  • SYLODENT®
  • SYLOID®
  • SYLOJET®
  • SYLOX®
  • Several Catalyst grades including synthetic amorphous silica, e.g. SYLOPOL®, P.O. CAT CARRIER XPO, Ziegler Natta Catalyst grades
  • SiO2
  • SiO2-Sootstaub
  • Sident [Silica, precipitated]
  • Sident [Silica, precipitated]
  • Silcron
  • Silfil
  • Silica
  • Silica Gel
  • Silicagel
  • Silicon Dioxide
  • Silicon dioxide (SD-B)
  • Silicon dioxide as used in different catalyst mixtures
  • Silicon dioxide in different catalyst mixtures
  • Silizium Dioxid
  • Siliziumdioxid
  • Sipernat [Silica, precipitated]
  • Sipernat [Silica, precipitated]
  • SmART Catalyst System® series, SmART System
  • Sodium dihydrogenorthophosphate
  • Sorb-it
  • Sorbosil
  • Sorbsil
  • StART™ System, StART™ Catalyst System
  • T-Lite
  • TAFOSIL
  • TAVERSIL
  • TIXOSIL
  • TP88
  • TREADSIL
  • TRISYL®
  • TYSIL
  • Thermal Wrap™
  • Tokusil
  • Tolled trading goods
  • ULS
  • ULTRABOND™ fumed silica
  • Ultrasil [Silica, precipitated]
  • Ultrasil [Silica, precipitated]
  • WL [Silica, precipitated]
  • Wet Gel
  • Wetgel
  • White Carbon HCSIL
  • White Gel
  • XWP GEL
  • YH [Silica, precipitated]
  • ZEODENT®
  • ZEOFLO®
  • ZEOFOAM®
  • ZEOFREE®
  • ZEOPOL®
  • ZEOSIL
  • ZEOSYL®
  • ZEOTHIX®
  • ZEO®
  • ZS
  • Zeobead
  • Zeoprep
  • Zeosphere
  • carbon-white
  • fumed silica
  • insert your own names, for example "Aerosil"
  • silica gel
  • silicon dioxide
  • white carbon black
  • I0250
    (No other type specified)
    The silica substance that we are registering is pyrogenic
    (No other type specified)

    Compositions

    Boundary Composition(s) open all close all

    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Snythetic amorphous silicon dioxide, nanostructured material_Set1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silica, nanostructured material
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide, nanostructured material, silanized
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    Surface treatments
    Surface treatment name:
    SAS Silanized
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
    Percentage of coverage of particle surface, %:
    >= 30 - < 100
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic Amorphous Silica, set of nanoforms (Boundary composition provided by Lead Registrant in co-ordination with SAS REACH Consortium)
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material_Set1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    Surface treatments
    Surface treatment name:
    Silanized SAS
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
    Percentage of coverage of particle surface, %:
    > 0 - < 50
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide (SAS), nanomaterial, silanized

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Fraction of constituent particles in the size range 1-100 nm:
    100 - 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    synthetic amorphous silicon dioxide (SAS), nanomaterial

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    > 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Fraction of constituent particles in the size range 1-100 nm:
    100 - 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material_Set1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
    Fraction of constituent particles in the size range 1-100 nm:
    >= 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    >= 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal struc ture.
    Fraction of constituent particles in the size range 1-100 nm:
    >= 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    >= 99.7 - <= 100 %
    Description:
    In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction di agrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit f or crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Colloidal silica suspension
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material_Set 1
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Name:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    no
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane

    Characterisation of nanoforms

    Type of information reported:
    set of nanoforms
    Name of set of nanoforms:
    Synthetic amorphous silicon dioxide, nanostructured material, silanized_Set 2
    Cross-reference
    Reason / purpose:
    justification for reporting set of similar nanoforms

    Shape

    Shape description
    Shape category:
    spheroidal
    Shape:
    other: 3-dimensional branched fractal aggregates
    Pure shape:
    yes
    Range:
    >= 99 - <= 100 %

    Particle size distribution and range

    Particle size distribution and range
    Shape category:
    spheroidal
    Percentileopen allclose all
    Percentile:
    D10
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D50
    Range:
    >= 1 - <= 100 nm
    Percentile:
    D90
    Range:
    >= 1 - <= 100 nm
    Additional information:
    The particle forming mechanism for each manufacturing process starts with the formation of liquid nuclei that grow to constituent particles that coagulate to aggregates and solidify. Constituent particles are therefore spherical in nature while aggregates (and agglomerates) show a high fractal structure.
    Fraction of constituent particles in the size range 1-100 nm:
    > 50 - <= 100 %

    Crystallinity

    Structures
    Structure:
    amorphous
    Pure structure:
    yes
    Range:
    > 99.7 - <= 100 %
    Description:
    In general, Silanized SAS contains no detectable amounts of crystalline silica. X-ray diffraction diagrams of SAS, show only a broad halo, revealing an X-ray amorphous structure. The detection limit for crystallinity by X-ray is in the maximum order of 0.3% by weight or below.

    Specific surface area

    Range of specific surface area:
    >= 4 - <= 1 000 m²/g
    Range of volume specific surface area:
    >= 8.8 - <= 2 200 m²/cm³
    Skeletal density:
    >= 1.7 - <= 2.25 g/cm³

    Surface functionalisation / treatment

    Surface treatment applied:
    yes
    Does the set contain both treated and non-surface treated nanoforms?:
    no
    Surface treatments
    Surface treatment name:
    Silanized SAS
    Surface treatment
    Order:
    #1
    External layer:
    hydrophobic
    Description:
    The surface treatment agents are alkoxy- or chlorosilanes, silazanes, and/or siloxanes and have been generally registered under REACH as relevant. The use as surface treatment agents is described in the REACH dossiers and exposure scenarios of specific alkoxysilanes, chlorosilanes, silazanes and/or siloxanes. The carbon content at the surface of SAS Silanized is less than 20 wt.-% typically less than 10 wt-%.
    Percentage of coverage of particle surface, %:
    > 0 - < 50
    State Form:
    solid: nanoform


    Constituent 1
    Chemical structure
    Reference substance name:
    Silicon dioxide
    EC Number:
    231-545-4
    EC Name:
    Silicon dioxide
    CAS Number:
    7631-86-9
    Molecular formula:
    O2Si
    IUPAC Name:
    dioxosilane